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1. (WO2018020320) METHOD AND APPARATUS FOR FILLING A GAP

Pub. No.:    WO/2018/020320    International Application No.:    PCT/IB2017/001070
Publication Date: Fri Feb 02 00:59:59 CET 2018 International Filing Date: Sat Jul 15 01:59:59 CEST 2017
IPC: C23C 16/02
C23C 16/04
C23C 16/40
C23C 16/455
H01L 21/02
H01L 21/762
H01L 21/768
C23C 16/30
Applicants: ASM IP HOLDING B.V.
Inventors: MASARU, Zaitsu
FUKAZAWA, Atsuki
Title: METHOD AND APPARATUS FOR FILLING A GAP
Abstract:
According to the invention a method for filling one or more gaps created during manufacturing of a feature on a substrate is provided by providing the substrate in a reaction chamber and providing a deposition method. The deposition method comprises; providing an anisotropic plasma to bombard a bottom area of a surface of the one or more gaps with ions thereby creating adsorption sites at the bottom area; introducing a first reactant to the substrate; and, allowing the first reactant to react with the adsorption sites at the bottom area of the surface to fill the one or more gaps from the bottom area upwards.