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|1. (WO2018020320) METHOD AND APPARATUS FOR FILLING A GAP|
|Applicants:||ASM IP HOLDING B.V.
|Title:||METHOD AND APPARATUS FOR FILLING A GAP|
According to the invention a method for filling one or more gaps created during manufacturing of a feature on a substrate is provided by providing the substrate in a reaction chamber and providing a deposition method. The deposition method comprises; providing an anisotropic plasma to bombard a bottom area of a surface of the one or more gaps with ions thereby creating adsorption sites at the bottom area; introducing a first reactant to the substrate; and, allowing the first reactant to react with the adsorption sites at the bottom area of the surface to fill the one or more gaps from the bottom area upwards.