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1. (WO2018019277) MACHINE VISION SYSTEM FOR SUBSTRATE ALIGNMENT AND ALIGNMENT DEVICE

Pub. No.:    WO/2018/019277    International Application No.:    PCT/CN2017/094769
Publication Date: Fri Feb 02 00:59:59 CET 2018 International Filing Date: Fri Jul 28 01:59:59 CEST 2017
IPC: H01L 21/68
Applicants: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
上海微电子装备(集团)股份有限公司
Inventors: ZHU, Zhi
朱鸷
HUO, Zhijun
霍志军
Title: MACHINE VISION SYSTEM FOR SUBSTRATE ALIGNMENT AND ALIGNMENT DEVICE
Abstract:
A machine vision system for substrate alignment, comprising first and second illumination light sources (11, 12), first and second reflecting mirrors (21, 22), first and second objective lenses (31, 32) and first and second detectors (41, 42). The first and second illumination light sources, the first and second reflecting mirrors, the first and second objective lenses and the first and second detectors are symmetrical about an X axis, illumination light emitted by the first and the second illumination light sources is irradiated onto a corresponding substrate (1, 2) for reflection, and is projected onto the corresponding detector for detection after being amplified by the corresponding objective lens. Also disclosed is an alignment device. The first and second illumination light sources, the first and second reflecting mirrors, the first and second objective lenses and the first and second detectors are symmetrical about an X axis, thus greatly reducing the occupancy volume of a machine vision system in the direction of a lens cone, enlarging the detection range of the machine vision system, and improving the alignment efficiency and precision.