Search International and National Patent Collections

1. (WO2018019225) DOCKING DEVICE AND METHOD FOR SUBSTRATE

Pub. No.:    WO/2018/019225    International Application No.:    PCT/CN2017/094271
Publication Date: Fri Feb 02 00:59:59 CET 2018 International Filing Date: Wed Jul 26 01:59:59 CEST 2017
IPC: H01L 21/683
H01L 21/677
Applicants: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
上海微电子装备(集团)股份有限公司
Inventors: WANG, Dong
王东
LIU, Kai
刘凯
WANG, Gang
王刚
RUAN, Dong
阮冬
SONG, Haijun
宋海军
Title: DOCKING DEVICE AND METHOD FOR SUBSTRATE
Abstract:
Provided are a docking device and method for a substrate. The docking device for a substrate comprises a rotation mechanism (110) driving a substrate to rotate and at least one substrate suction mechanism (120). The substrate suction mechanism (120) is used to support and fix the substrate. The rotation mechanism (110) drives the substrate suction mechanism (120) to rotate. The docking device for a substrate can preferentially rotate a substrate to a required angular position when the substrate needs to enter a substrate production line apparatus or enter a storage area from a different angular position, thereby realizing rotary docking of the substrate.