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1. (WO2018019113) ELECTRONIC DEVICE AND METHOD FOR THE ELECTRONIC DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/019113    International Application No.:    PCT/CN2017/092158
Publication Date: 01.02.2018 International Filing Date: 07.07.2017
IPC:
H04W 72/04 (2009.01), H04W 72/08 (2009.01)
Applicants: SONY CORPORATION [JP/JP]; 1-7-1, Konan Minato-ku Tokyo 108-0075 (JP) (For All Designated States Except US).
ZHAO, Youping [CN/CN]; (CN) (US only).
WANG, Yiteng [CN/CN]; (CN) (US only).
GUO, Xin [CN/CN]; (CN) (US only).
SUN, Chen [CN/CN]; (CN) (US only)
Inventors: ZHAO, Youping; (CN).
WANG, Yiteng; (CN).
GUO, Xin; (CN).
SUN, Chen; (CN)
Agent: UNITALEN ATTORNEYS AT LAW; 7th Floor, Scitech Place No. 22, Jian Guo Men Wai Ave., Chao Yang District Beijing 100004 (CN)
Priority Data:
201610616478.6 29.07.2016 CN
Title (EN) ELECTRONIC DEVICE AND METHOD FOR THE ELECTRONIC DEVICE
(FR) DISPOSITIF ÉLECTRONIQUE ET PROCÉDÉ POUR LE DISPOSITIF ÉLECTRONIQUE
(ZH) 电子设备和用于电子设备的方法
Abstract: front page image
(EN)Provided are an electronic device and a method for the electronic device. The electronic device comprises a processing circuit, configured to: determine sub-systems in a specific region; and based on relative interference between the sub-systems and quality of service requirements for the sub-systems, clustering the sub-systems.
(FR)L'invention concerne un dispositif électronique et un procédé pour le dispositif électronique. Le dispositif électronique comprend un circuit de traitement configuré pour déterminer des sous-systèmes dans une zone spécifique, et pour regrouper ces sous-systèmes en fonction d'une interférence relative entre eux et de la qualité des exigences de service pour eux.
(ZH)本公开提供了一种电子设备和用于电子设备的方法,该电子设备包括:处理电路,被配置为:确定处于特定区域中的次系统;以及基于次系统之间的相对干扰和次系统的服务质量需求对次系统进行分簇。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)