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1. (WO2018017389) A FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY

Pub. No.:    WO/2018/017389    International Application No.:    PCT/US2017/041893
Publication Date: Fri Jan 26 00:59:59 CET 2018 International Filing Date: Fri Jul 14 01:59:59 CEST 2017
IPC: G03F 7/20
Applicants: APPLIED MATERIALS, INC.
Inventors: TUNG, Yeishin
VAN DEN BROEKE, Douglas Joseph
MANENS, Antoine P.
CHEN, Jang Fung
Title: A FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY
Abstract:
Embodiments disclosed herein generally relate to adjusting a focus setting for a digital lithography system. The method includes scanning a surface of a photoresist. The photoresist is formed on a substrate. A focus setting for the digital lithography system is determined. A plurality of exposure location on the photoresist are located. A sidewall width of the exposure is measured for a plurality of focus settings. The focus setting is adjusted in response to determining a minimum sidewall width.