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1. (WO2018016375) GAS SUPPLY APPARATUS AND GAS SUPPLY METHOD
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Pub. No.: WO/2018/016375 International Application No.: PCT/JP2017/025214
Publication Date: 25.01.2018 International Filing Date: 11.07.2017
IPC:
F17C 9/00 (2006.01) ,C23C 16/448 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
17
STORING OR DISTRIBUTING GASES OR LIQUIDS
C
VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
9
Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
448
characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Applicants:
昭和電工株式会社 SHOWA DENKO K.K. [JP/JP]; 東京都港区芝大門一丁目13番9号 13-9, Shiba Daimon 1-chome, Minato-ku, Tokyo 1058518, JP
Inventors:
青木 隆典 AOKI, Takanori; JP
三神 克己 MIKAMI, Katsumi; JP
Agent:
大谷 保 OHTANI, Tamotsu; JP
Priority Data:
2016-14265220.07.2016JP
Title (EN) GAS SUPPLY APPARATUS AND GAS SUPPLY METHOD
(FR) APPAREIL D'ALIMENTATION EN GAZ ET PROCÉDÉ D'ALIMENTATION EN GAZ
(JA) ガス供給装置及びガス供給方法
Abstract:
(EN) Provided is a gas supply apparatus for supplying a gas compound obtained by vaporizing a liquid compound to a target location, the gas supply apparatus being provided with: a storage vessel capable of storing the liquid compound; a gas compound supply pipeline, one end of which is connected to the storage vessel, and the other end of which can be disposed at the target location; and a temperature control device that controls the temperature of the gas compound or the liquid compound within the storage vessel so as to be kept equal to or lower than the surrounding temperature of the gas compound supply pipeline.
(FR) L'invention porte sur un appareil d'alimentation en gaz permettant de fournir un composé gazeux obtenu par vaporisation d'un composé liquide vers un emplacement cible, l'appareil d'alimentation en gaz étant pourvu des éléments suivants : un récipient de stockage apte à stocker le composé liquide ; une canalisation d'alimentation en composé gazeux, dont une extrémité est reliée au récipient de stockage, et dont l'autre extrémité peut être disposée au niveau de l'emplacement cible ; et un dispositif de régulation de température, qui régule la température du composé gazeux ou du composé liquide à l'intérieur du récipient de stockage de façon à être maintenu à une température inférieure ou égale à la température ambiante de la canalisation d'alimentation en composé gazeux.
(JA) 液体化合物から気化したガス化合物を対象箇所まで供給するためのガス供給装置であって、前記液体化合物を収容可能な貯蔵容器と、一端が前記貯蔵容器に接続されており、他端が前記対象箇所に配置可能となっているガス化合物供給配管と、前記貯蔵容器内における前記ガス化合物又は液体化合物の温度を前記ガス化合物供給配管の周囲の温度以下に制御する温度制御装置と、を有するガス供給装置。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)