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1. (WO2018015079) LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD
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Pub. No.: WO/2018/015079 International Application No.: PCT/EP2017/064738
Publication Date: 25.01.2018 International Filing Date: 16.06.2017
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants: ASML NETHERLANDS B.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
CARL ZEISS SMT GMBH[DE/DE]; Rudolf-Eber-Strasse 2 73447 Oberkochen, DE
Inventors: BUTLER, Hans; NL
GEUPPERT, Bernhard; DE
LOOPSTRA, Erik, Roelof; DE
WIJCKMANS, Maurice, Willem, Jozef, Etiënne; NL
Agent: VERHOEVEN, Johannes; NL
Priority Data:
16180675.722.07.2016EP
Title (EN) LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL LITHOGRAPHIQUE, APPAREIL DE PROJECTION LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Abstract:
(EN) The present invention relates to a lithographic apparatus, comprising: - a base frame (10), adapted for mounting the lithographic apparatus (1) on a support surface (9), - a projection system (20) comprising: - a force frame (30), - an optical element (21) which is moveable relative to the force frame, - a sensor frame (40), which is separate from the force frame, - at least one sensor which is adapted to monitor the optical element, comprising at least one sensor (25) element which is mounted to the sensor frame, - a force frame support (31), which is adapted to support the force frame on the base frame, - an intermediate frame (45), which is separate from the force frame, - a sensor frame coupler (41), which is adapted to couple the sensor frame to the intermediate frame, - an intermediate frame support (46), which is separate from the force fame support and adapted to support the intermediate frame on the base frame.
(FR) La présente invention concerne un appareil lithographique, comprenant : - un cadre de base (10), conçu pour monter l'appareil lithographique (1) sur une surface de support (9), - un système de projection (20) comprenant : - un cadre de force (30), - un élément optique (21) qui est mobile par rapport au cadre de force, - un cadre de capteur (40), qui est séparé du cadre de force, - au moins un capteur qui est conçu pour surveiller l'élément optique, comprenant au moins un élément capteur (25) qui est monté sur le cadre de capteur, - un support de cadre de force (31), qui est conçu pour soutenir le cadre de force sur le cadre de base, - un cadre intermédiaire (45), qui est séparé du cadre de force, - un accouplement de cadre de capteur (41), qui est conçu pour accoupler le cadre de capteur au cadre intermédiaire - et un support de cadre intermédiaire (46), qui est séparé du support de cadre de force et conçu pour soutenir le cadre intermédiaire sur le cadre de base.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)