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1. (WO2018013757) METHODS OF REDUCING SURFACE ROUGHNESS OF REFLECTANCE COATINGS FOR DUV MIRRORS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/013757 International Application No.: PCT/US2017/041845
Publication Date: 18.01.2018 International Filing Date: 13.07.2017
IPC:
G02B 5/08 (2006.01) ,G02B 1/14 (2015.01) ,G21K 1/06 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
08
Mirrors
[IPC code unknown for G02B 1/14]
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1
Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06
using diffraction, refraction, or reflection, e.g. monochromators
Applicants: CORNING INCORPORATED[US/US]; 1 Riverfront Plaza Corning, New York 14831, US
Inventors: D'LALLO, Michael Joseph; US
WANG, Jue; US
Agent: SHORT, Svetlana Z.; US
Priority Data:
62/362,20514.07.2016US
Title (EN) METHODS OF REDUCING SURFACE ROUGHNESS OF REFLECTANCE COATINGS FOR DUV MIRRORS
(FR) PROCÉDÉS DE RÉDUCTION DE LA RUGOSITÉ DE SURFACE DE REVÊTEMENTS DE RÉFLECTANCE POUR MIROIRS DUV
Abstract:
(EN) A method of reducing surface roughness of DUV reflectance coatings for a DUV mirror to improve the reflectance of the DUV mirror includes: forming the reflectance coating on a substrate, the reflectance coating including a film stack comprising multiple dielectric layers, including an uppermost layer. The method also includes adding to the uppermost layer a cap layer comprising SiO2 and having an upper surface with an initial RMS amount of surface roughness. The method further includes adding a sacrificial layer to the upper surface of the cap layer, wherein the sacrificial layer comprises SiO2. The method also includes etching the sacrificial layer down to the cap layer so that the upper surface of the cap layer has a final RMS amount of surface roughness that is less than the initial amount of surface roughness.
(FR) L'invention porte sur un procédé de réduction de la rugosité de surface de revêtements de réflectance DUV pour un miroir DUV afin d'améliorer la réflectance du miroir DUV, lequel procédé comprend la formation du revêtement de réflectance sur un substrat, le revêtement de réflectance comprenant un empilement de films comprenant de multiples couches diélectriques, dont une couche supérieure. Le procédé comprend également l'ajout à la couche supérieure d'une couche de recouvrement comprenant du SiO2 et ayant une surface supérieure présentant une quantité initiale de rugosité de surface RMS efficace. Le procédé comprend en outre l'ajout d'une couche sacrificielle à la surface supérieure de la couche de recouvrement, la couche sacrificielle comprenant du SiO2. Le procédé consiste également à graver la couche sacrificielle jusqu'à la couche de recouvrement de sorte que la surface supérieure de la couche de recouvrement présente une quantité finale de rugosité de surface RMS efficace inférieure à la quantité initiale de rugosité de surface.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)