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1. (WO2018013387) MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/013387    International Application No.:    PCT/US2017/040684
Publication Date: 18.01.2018 International Filing Date: 05.07.2017
IPC:
C23C 14/34 (2006.01), C04B 35/04 (2006.01), C04B 35/645 (2006.01)
Applicants: TOSOH SMD, INC. [US/US]; 3600 Gantz Road Grove City, Ohio 43123 (US)
Inventors: IVANOV, Eugene Y.; (US).
JAWORSKI, Christopher M.; (US)
Agent: FABRY, Michelle M.; (US).
PEACOCK, Bruce E.; (US).
WORGULL, Jason A.; (US).
HAWK, Julie D.; (US).
HAYES, Charles Andrew; (US).
COTTON, Benjamin B.; (US).
RESSER, David A.; (US)
Priority Data:
62/361,562 13.07.2016 US
Title (EN) MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
(FR) CIBLE DE PULVÉRISATION D'OXYDE DE MAGNÉSIUM ET SON PROCÉDÉ DE FABRICATION
Abstract: front page image
(EN)A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt% or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99wt% or higher, a density of 3.58 g/cm3 or higher, and an average crystal grain size of 50 μm or more.
(FR)Cette invention concerne une cible de pulvérisation d'oxyde de magnésium compacte frittée ayant une pureté de 99,99 % en poids ou plus, une densité de 3,58 g/cm3 ou plus, et une transparence de 10 % ou plus. L'invention concerne en outre une cible de pulvérisation d'oxyde de magnésium compacte frittée ayant une pureté de 99,99 % en poids ou plus, une densité de 3,58 g/cm3 et une taille moyenne du grain cristallin de 50 μm ou plus.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)