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1. (WO2018012175) PROCESS FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD

Pub. No.:    WO/2018/012175    International Application No.:    PCT/JP2017/021694
Publication Date: Fri Jan 19 00:59:59 CET 2018 International Filing Date: Tue Jun 13 01:59:59 CEST 2017
IPC: C09K 3/14
B24B 37/00
C09G 1/02
H01L 21/304
Applicants: FUJIMI INCORPORATED
株式会社フジミインコーポレーテッド
Inventors: IZAWA, Yoshihiro
井澤 由裕
SUZUKI, Shota
鈴木 章太
Title: PROCESS FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD
Abstract:
The present invention provides a process for producing a polishing composition with which a work can be polished at a high polishing rate with few scratches (defects). The present invention relates to a process for producing a polishing composition, the process comprising: preparing silica which, when analyzed by Raman spectroscopy, shows a peak assigned to the four-membered silica ring structure and a peak assigned to the silica random-network structure, the peaks respectively having intensities that satisfy a given requirement; and mixing the silica with a dispersion medium.