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Pub. No.:    WO/2018/010292    International Application No.:    PCT/CN2016/099073
Publication Date: 18.01.2018 International Filing Date: 14.09.2016
G06F 3/041 (2006.01)
Applicants: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO.,LTD. [CN/CN]; No.9-2, Tangming Road, Guangming Shenzhen, Guangdong 518132 (CN).
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD [CN/CN]; Building C5,Biolake of Optics Valley, No.666 Gaoxin Avenue, East Lake High-tech Development Zone Wuhan, Hubei 430070 (CN)
Inventors: LI, Man; (CN).
XING, Zhenzhou; (CN).
GUO, Xingling; (CN)
Agent: MING & YUE INTELLECTUAL PROPERTY LAW FIRM; Suite 611, 6/F, Block 206, Nanyou Second Industrial Zone(Block B,HengYue Center), No.21 Dengliang Road, Nanshan Shenzhen, Guangdong 518054 (CN)
Priority Data:
201610548514.X 13.07.2016 CN
(ZH) 一种压力触控结构
Abstract: front page image
(EN)Provided is a force touch structure, comprising: a touch layer; a display layer; and a force sensing layer. The touch layer, the display layer and the force sensing layer are sequentially stacked. The force touch structure further comprises an individual metal shielding layer.
(FR)L'invention concerne une structure de force tactile, comprenant : une couche tactile; une couche d'affichage; et une couche de détection de force. La couche tactile, la couche d'affichage et la couche de détection de force sont empilées séquentiellement. La structure de contact à force comprend en outre une couche de protection métallique individuelle.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)