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1. (WO2018009888) PHOTOSTABLE COMPOSITIONS COMPRISING PARA-ALKOXYL PHENYL SUBSTITUTED PROPENOIC ACID (APP) COPOLYMER DERIVATIVES
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/009888    International Application No.:    PCT/US2017/041232
Publication Date: 11.01.2018 International Filing Date: 07.07.2017
IPC:
A61K 8/90 (2006.01), A61K 8/36 (2006.01), A61K 8/37 (2006.01), A61Q 17/04 (2006.01), A61Q 19/00 (2006.01)
Applicants: HALLSTAR INNOVATIONS CORP. [US/US]; 120 South Riverside Plaza, Suite 1620 Chicago, IL 60606-3919 (US)
Inventors: FENG, Hui; (US).
HU, Shengkui; (US).
ZLOTNIK, Dennis; (US)
Agent: ROGERS, Steven; (US)
Priority Data:
62/359,539 07.07.2016 US
Title (EN) PHOTOSTABLE COMPOSITIONS COMPRISING PARA-ALKOXYL PHENYL SUBSTITUTED PROPENOIC ACID (APP) COPOLYMER DERIVATIVES
(FR) COMPOSITIONS PHOTOSTABLES COMPRENANT DES DÉRIVÉS COPOLYMÈRES D'ACIDE PROPÉNOÏQUE À SUBSTITUTION PHÉNYLE PARA ALCOXYLE (APP)
Abstract: front page image
(EN)The present disclosure relates, according to some embodiments, to photostable photoactive compositions comprising (a) at least one photoactive compound that develops within itself an excited state energy when subjected to UV radiation and (b) a block copolymer comprising a plurality of blocks, wherein the block copolymer is operable to quench the excited state energy.
(FR)La présente invention concerne, selon certains modes de réalisation, des compositions photo-actives photostables comprenant (a) au moins un composé photo-actif qui développe en son sein une énergie à l'état excité lorsqu'il est soumis à un rayonnement UV et (b) un copolymère à blocs comprenant une pluralité de blocs, le copolymère à blocs pouvant être utilisé pour désactiver l'énergie à l'état excité.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)