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1. WO2018008586 - COMPOSITION FOR PLASMA PROCESSING DETECTION AND INDICATOR FOR PLASMA PROCESSING DETECTION

Publication Number WO/2018/008586
Publication Date 11.01.2018
International Application No. PCT/JP2017/024314
International Filing Date 03.07.2017
IPC
G01N 31/22 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
31Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroups; Apparatus specially adapted for such methods
22using chemical indicators
C09D 11/037 2014.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
11Inks
02Printing inks
03characterised by features other than the chemical nature of the binder
037characterised by the pigment
H01L 21/3065 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
306Chemical or electrical treatment, e.g. electrolytic etching
3065Plasma etching; Reactive-ion etching
CPC
C09D 11/037
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
11Inks
02Printing inks
03characterised by features other than the chemical nature of the binder
037characterised by the pigment
G01N 31/22
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
31Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
22using chemical indicators
H01L 21/3065
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
18the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
302to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
306Chemical or electrical treatment, e.g. electrolytic etching
3065Plasma etching; Reactive-ion etching
Applicants
  • 株式会社サクラクレパス SAKURA COLOR PRODUCTS CORPORATION [JP]/[JP]
Inventors
  • 作村 武志 SAKUMURA Takeshi
Priority Data
2016-13420506.07.2016JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) COMPOSITION FOR PLASMA PROCESSING DETECTION AND INDICATOR FOR PLASMA PROCESSING DETECTION
(FR) COMPOSITION ET INDICATEUR PERMETTANT LA DÉTECTION D'UN TRAITEMENT AU PLASMA
(JA) プラズマ処理検知用組成物及びプラズマ処理検知用インジケーター
Abstract
(EN)
[Problem] To provide a composition for plasma processing detection and an indicator for plasma processing detection, which have high sensitivity. [Solution] A composition for plasma processing detection, which contains one or more first dyes selected from the group consisting of azo, anthraquinone, methine and xanthene and a discoloration accelerator that accelerates discoloration of the first dyes in a plasma processing atmosphere. This composition for plasma processing detection is characterized in that: the discoloration accelerator contains one or more compounds represented by a chemical structural formula that comprises a chemical structure wherein two benzene rings are linked by a single bond or a linking group; and the linking group links the two benzene rings by having two or three single bonds connected in series.
(FR)
Le problème abordé par la présente invention est de pourvoir à une composition et à un indicateur de sensibilité élevée permettant la détection d'un traitement au plasma. La solution selon l'invention porte sur une composition permettant la détection d'un traitement au plasma, qui contient un ou plusieurs premiers colorants choisis dans le groupe constitué par un colorant azoïque, l'anthraquinone, la méthine et le xanthène, et un accélérateur de décoloration qui accélère la décoloration des premiers colorants dans une atmosphère de traitement au plasma. La composition permettant la détection du traitement au plasma est caractérisée en ce que: l'accélérateur de décoloration contient un ou plusieurs composés représentés par une formule structurale chimique qui comprend une structure chimique où deux cycles benzène sont liés par une liaison simple ou par un groupe de liaison ; le groupe de liaison liant les deux cycles benzène grâce à deux ou trois liaisons simples reliées en série.
(JA)
(課題)感度の高いプラズマ処理検知用組成物及びプラズマ処理検知用インジケーターを提供すること。 (解決手段)アゾ、アントラキノン、メチン、及びキサンテンからなる群から選択される1種以上の第1の色素及び該第1の色素をプラズマ処理雰囲気下で変色を促進するための変色促進剤を含有するプラズマ処理検知用組成物であって、前記変色促進剤は、2つのベンゼン環が単結合又は連結基により連結された化学構造を包含する化学構造式により表わされる化合物を1種以上含み、前記連結基は、2つ又は3つの単結合が直列につながることにより2つのベンゼン環を連結することを特徴とする、プラズマ処理検知用組成物。
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