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1. WO2018008366 - HOLDING DEVICE, PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING ARTICLE

Publication Number WO/2018/008366
Publication Date 11.01.2018
International Application No. PCT/JP2017/022347
International Filing Date 16.06.2017
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 5/10 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
10with curved faces
G02B 7/185 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
182for mirrors
185with means for adjusting the shape of the mirror surface
CPC
G02B 5/10
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
10with curved faces
G02B 7/185
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
182for mirrors
185with means for adjusting the shape of the mirror surface
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
Applicants
  • キヤノン株式会社 CANON KABUSHIKI KAISHA [JP]/[JP]
Inventors
  • 春見 和之 KASUMI, Kazuyuki
Agents
  • 高岡 亮一 TAKAOKA, Ryoichi
  • 小田 直 ODA, Nao
Priority Data
2016-13525307.07.2016JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) HOLDING DEVICE, PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING ARTICLE
(FR) DISPOSITIF DE MAINTIEN, SYSTÈME OPTIQUE DE PROJECTION, DISPOSITIF D'EXPOSITION ET PROCÉDÉ DE FABRICATION D'UN ARTICLE
(JA) 保持装置、投影光学系、露光装置、および物品製造方法
Abstract
(EN)
The purpose of the present invention is to provide a holding device advantageous for reducing the effects of gravity deformation of an optical element having a curved surface. Provided is a holding device 110 for holding an optical element M having a curved surface such that the direction of the optical axis is the horizontal direction, wherein the holding device has a support member 112 for supporting the optical element M. The support member (112) supports a part by which the support member (112) supports the optical element (M) at an inclination with respect to the direction of the optical axis in a plane that includes the direction of the optical axis of the optical element (M) and the direction of gravity.
(FR)
L'objet de la présente invention est de fournir un dispositif de maintien avantageux pour réduire les effets de la déformation par gravité d'un élément optique ayant une surface incurvée. L'invention porte sur un dispositif de maintien (110) pour maintenir un élément optique M ayant une surface incurvée de telle sorte que la direction de l'axe optique soit la direction horizontale, le dispositif de maintien ayant un élément de support (112) pour supporter l'élément optique M. L'élément de support (112) supporte une partie par laquelle l'élément de support (112) supporte l'élément optique (M) selon une inclinaison par rapport à la direction de l'axe optique dans un plan qui comprend la direction de l'axe optique de l'élément optique (M) et le sens de la gravité.
(JA)
曲面を有する光学素子の自重変形の影響を軽減するのに有利な保持装置を提供する。 曲面を有する光学素子Mを、その光軸方向が水平方向となるように保持する保持装置110であって、光学素子Mを支持する支持部材112を有し、光学素子(M)の光軸の方向と重力の方向とを含む平面内において、支持部材(112)は、支持部材(112)が光学素子(M)を支持する部分を光軸の方向に対して傾けて支持している。
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