Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018008310) PLASMA DISCHARGE APPARATUS AND AIR-CLEANING MACHINE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2018/008310 International Application No.: PCT/JP2017/020671
Publication Date: 11.01.2018 International Filing Date: 02.06.2017
IPC:
H05H 1/24 (2006.01) ,A61L 9/22 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
A HUMAN NECESSITIES
61
MEDICAL OR VETERINARY SCIENCE; HYGIENE
L
METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION, OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICAL ARTICLES
9
Disinfection, sterilisation or deodorisation of air
16
using physical phenomena
22
Ionisation
Applicants:
パナソニックIPマネジメント株式会社 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. [JP/JP]; 大阪府大阪市中央区城見2丁目1番61号 1-61, Shiromi 2-chome, Chuo-ku, Osaka-shi, Osaka 5406207, JP
Inventors:
林 雅則 HAYASHI Masanori; --
Agent:
鎌田 健司 KAMATA Kenji; JP
前田 浩夫 MAEDA Hiroo; JP
Priority Data:
2016-13622508.07.2016JP
2016-13626408.07.2016JP
Title (EN) PLASMA DISCHARGE APPARATUS AND AIR-CLEANING MACHINE
(FR) APPAREIL DE DÉCHARGE DE PLASMA ET MACHINE DE NETTOYAGE À L'AIR
(JA) プラズマ放電装置及び空気清浄機
Abstract:
(EN) A plasma discharge apparatus (100) is provided with: a discharge unit (6) that has a pair of electrodes (60) insulated from each other by air (68); and a pulse generation circuit (2) that generates voltage pulses (P0) applied to the electrode pair (60), wherein the voltage pulses (P0) include: a high-voltage pulse (PH) that starts discharging between the electrodes; and a low-voltage pulse (PL) that is lower in voltage value than the high-voltage pulse (PH) and is applied to the electrode pair (60) following the high-voltage pulse (PH), and the pulse generation circuit (2) has a limiting circuit (40) that limits an output current and an output voltage to be outputted when the low-voltage pulse (PL) is applied to the electrode pair (60).
(FR) L'invention porte sur un appareil de décharge de plasma (100) qui comporte : une unité de décharge (6) qui a une paire d'électrodes (60) isolées l'une de l'autre par de l'air (68) ; et un circuit de génération d'impulsion (2) qui génère des impulsions de tension (P0) appliquées à la paire d'électrodes (60), les impulsions de tension (P0) comprenant : une impulsion haute tension (PH) qui commence à se décharger entre les électrodes ; et une impulsion basse tension (PL) qui présente une valeur de tension inférieure à celle de l'impulsion haute tension (PH) et qui est appliquée à la paire d'électrodes (60) suite à l'impulsion haute tension (PH), et le circuit de génération d'impulsion (2) comporte un circuit de limitation (40) qui limite un courant de sortie et une tension de sortie à sortir lorsque l'impulsion basse tension (PL) est appliquée à la paire d'électrodes (60).
(JA) プラズマ放電装置(100)は、空気(68)で互いに絶縁された電極対(60)を有する放電部(6)と、電極対(60)に印加する電圧パルス(P0)を生成するパルス生成回路(2)とを備え、電圧パルス(P0)は、電極対(60)間において放電を開始させる高電圧パルス(PH)と、高電圧パルス(PH)に続いて電極対(60)に印加され、高電圧パルス(PH)より電圧値が低い低電圧パルス(PL)とを含み、パルス生成回路(2)は、低電圧パルス(PL)を電極対(60)に印加する際に出力する出力電流及び出力電圧を制限する制限回路(40)を有する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)