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1. (WO2018006524) CHELATE RESIN AND PREPARATION METHOD THEREFOR, AND USE OF CHELATE RESIN IN COPPER-CONTAINING NICKEL AND COBALT SOLUTION FOR DEEP COPPER REMOVAL
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2018/006524 International Application No.: PCT/CN2016/105772
Publication Date: 11.01.2018 International Filing Date: 14.11.2016
IPC:
B01J 20/26 (2006.01) ,B01J 20/30 (2006.01) ,C02F 1/28 (2006.01) ,C25C 1/08 (2006.01) ,C25C 7/06 (2006.01) ,C08F 12/14 (2006.01) ,C08F 8/30 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
20
Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
22
comprising organic material
26
Synthetic macromolecular compounds
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
20
Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
30
Processes for preparing, regenerating or reactivating
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
28
by sorption
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
C
PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
1
Electrolytic production, recovery or refining of metals by electrolysis of solutions
06
of iron group metals, refractory metals or manganese
08
of nickel or cobalt
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
C
PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
7
Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
06
Operating or servicing
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
12
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02
Monomers containing only one unsaturated aliphatic radical
04
containing one ring
14
substituted by hetero atoms or groups containing hetero atoms
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
30
Introducing nitrogen atoms or nitrogen-containing groups
Applicants:
中南大学 CENTRAL SOUTH UNIVERSITY [CN/CN]; 中国湖南省长沙市 岳麓区麓山南路932号 No.932 South Lushan Road, Yuelu District Changsha, Hunan 410083, CN
Inventors:
胡慧萍 HU, Huiping; CN
王彩霞 WANG, Caixia; CN
邱雪景 QIU, Xuejing; CN
程泽英 CHENG, Zeying; CN
Agent:
长沙市融智专利事务所 RONG ZHI PATENT AGENCY; 中国湖南省长沙市 雨花区人民中路308号 No.308 Renmin Road, Yu Hua Distict Changsha, Hunan 410083, CN
Priority Data:
201610524804.005.07.2016CN
Title (EN) CHELATE RESIN AND PREPARATION METHOD THEREFOR, AND USE OF CHELATE RESIN IN COPPER-CONTAINING NICKEL AND COBALT SOLUTION FOR DEEP COPPER REMOVAL
(FR) RÉSINE DE CHÉLATE ET SON PROCÉDÉ DE PRÉPARATION, ET UTILISATION DE LA RÉSINE DE CHÉLATE DANS UNE SOLUTION DE NICKEL ET DE COBALT CONTENANT DU CUIVRE POUR L'ÉLIMINATION PROFONDE DU CUIVRE
(ZH) 一种螯合树脂及其制备方法和螯合树脂在含铜的镍、钴溶液深度除铜的应用
Abstract:
(EN) Provided is a chelate resin and a preparation method therefor and a use of the chelate resin in a copper-containing nickel and cobalt solution for deep copper removal. The chelate resin is grafted with a 2-amino methyl pyridine functional group containing both a tertiary amine group and an ester group. The functional group only has physical absorption with nickel (II) and cobalt (II) and has a chemical chelation effect with copper (II); same is grafted to a substrate such as silica gel or polystyrene. A series of chelate resins are obtained; the chelate resin reserves a special selective copper chelation function of the functional group, can be easily separated from a solution, can be applied in selectively removing copper in the copper-containing nickel and cobalt solution, and is particularly applicable to high-selectivity deep-purification copper removal of a nickel anodic electrolyte and a cobalt anodic electrolyte. The industrial requirements for purification copper removal can be meet.
(FR) L'invention porte sur une résine de chélate et sur son procédé de préparation et sur l'utilisation de la résine de chélate dans une solution de nickel et de cobalt contenant du cuivre pour l'élimination profonde du cuivre. La résine de chélate est greffée avec un groupe fonctionnel 2-amino méthyl pyridine contenant à la fois un groupe amine tertiaire et un groupe ester. Le groupe fonctionnel n'a qu'une absorption physique avec le nickel (II) et le cobalt (II) et a un effet de chélation chimique avec le cuivre (II); il est greffé sur un substrat tel que du gel de silice ou du polystyrène. On obtient des séries de résines de chélate; la résine de chélate réserve une fonction de chélation sélective spéciale de cuivre du groupe fonctionnel, et peut être facilement séparée d'une solution, peut être appliquée pour éliminer sélectivement le cuivre dans la solution de nickel et de cobalt contenant du cuivre, et est particulièrement applicable à l'élimination de cuivre à haute sélectivité et à purification profonde d'un électrolyte anodique de nickel et d'un électrolyte anodique de cobalt. Les exigences industrielles pour l'élimination du cuivre de purification peuvent être satisfaites.
(ZH) 提供了一种螯合树脂及其制备方法和螯合树脂在含铜的镍、钴溶液中深度除铜的应用,该螯合树脂接枝有同时含叔胺基和酯基的2-氨甲基吡啶功能基团,该功能基团对镍(II)、钴(II)只发生物理吸附,而与铜(II)发生化学螯合作用,将其接枝在硅胶或聚苯乙烯等基体上,获得一系列螯合树脂,螯合树脂保留了功能基团特殊的选择性螯合铜的功能,且易于从溶液中实现分离,可以应用于含铜的镍、钴溶液中铜的选择性去除,特别适用于镍电解阳极液及钴电解阳极液高选择性深度净化除铜,可满足净化除铜的工业要求。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)