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1. (WO2018006283) SUBSTRATE SUPPORTING APPARATUS

Pub. No.:    WO/2018/006283    International Application No.:    PCT/CN2016/088754
Publication Date: Fri Jan 12 00:59:59 CET 2018 International Filing Date: Thu Jul 07 01:59:59 CEST 2016
IPC: H01L 21/67
Applicants: ACM RESEARCH (SHANGHAI) INC.
Inventors: CHEN, Fufa
FANG, Zhiyou
WU, Jun
WANG, Hui
CHEN, Fuping
WANG, Wenjun
Title: SUBSTRATE SUPPORTING APPARATUS
Abstract:
A substrate supporting apparatus (300) for cleaning a back side of a substrate (107) is provided. The substrate supporting apparatus (300) has a hollow shaft (319) and a rotary spindle (303). The rotary spindle (303) is set in the hollow shaft (319) and a spacing is formed between an outer wall of the rotary spindle (303) and an inner wall of the hollow shaft (319). The outer wall of the rotary spindle (303) defines a blocking wall (322) and a recess (324) to prevent particles in the spacing from entering a gas groove (325) which is formed on the hollow shaft (319) and supplies gas to a front side of the substrate (107), avoiding the particles contaminating the front side of the substrate (107), which improves the quality of semiconductor devices.