Search International and National Patent Collections

1. (WO2018004645) THIN FILM RESISTOR INTEGRATED INTO LOCAL INTERCONNECT PRODUCTION

Pub. No.:    WO/2018/004645    International Application No.:    PCT/US2016/040668
Publication Date: Fri Jan 05 00:59:59 CET 2018 International Filing Date: Sat Jul 02 01:59:59 CEST 2016
IPC: H01L 21/768
H01L 21/8234
Applicants: INTEL CORPORATION
Inventors: LEE, Chen-Guan
HAFEZ, Walid M.
PARK, Joodong
CASSIDY-COMFORT, Everett S.
LIU, En-Shao
Title: THIN FILM RESISTOR INTEGRATED INTO LOCAL INTERCONNECT PRODUCTION
Abstract:
An embodiment includes an apparatus comprising: a fin based field effect transistor (FinFET) comprising a source, a drain, and a gate; a contact coupled to at least one of the source, the drain, and the gate; a thin film resistor (TFR); a first via coupled to the contact and a second via coupled to the TFR; and a bottom metallization (M) layer and additional M layers above the bottom M layer; wherein the TFR and the first and second vias are all below the bottom M layer. Other embodiments are described herein.