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1. (WO2018003269) SUBSTRATE INSPECTION DEVICE
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Pub. No.: WO/2018/003269 International Application No.: PCT/JP2017/016645
Publication Date: 04.01.2018 International Filing Date: 20.04.2017
Chapter 2 Demand Filed: 14.09.2017
IPC:
H01L 21/66 (2006.01) ,G01R 31/28 (2006.01) ,G06F 11/22 (2006.01) ,G06F 9/44 (2018.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
G PHYSICS
01
MEASURING; TESTING
R
MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
31
Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
28
Testing of electronic circuits, e.g. by signal tracer
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
11
Error detection; Error correction; Monitoring
22
Detection or location of defective computer hardware by testing during standby operation or during idle time, e.g. start-up testing
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
9
Arrangements for programme control, e.g. control unit
06
using stored programme, i.e. using internal store of processing equipment to receive and retain programme
44
Arrangements for executing specific programmes
Applicants:
東京エレクトロン株式会社 TOKYO ELECTRON LIMITED [JP/JP]; 東京都港区赤坂五丁目3番1号 3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325, JP
Inventors:
杉山 克昌 SUGIYAMA, Katsuaki; JP
三井 淳夫 MITSUI, Atsuo; JP
小菅 豊 KOSUGA, Yutaka; JP
成川 健一 NARIKAWA, Kenichi; JP
森田 慎吾 MORITA, Shingo; JP
Agent:
別役 重尚 BECCHAKU, Shigehisa; 東京都港区東新橋2丁目16番1号 ルーシスビル2階 Lusis Bldg. 2nd Floor, 16-1, Higashi Shinbashi 2-chome, Minato-ku, Tokyo 1050021, JP
Priority Data:
2016-12774228.06.2016JP
Title (EN) SUBSTRATE INSPECTION DEVICE
(FR) DISPOSITIF D'INSPECTION DE SUBSTRAT
(JA) 基板検査装置
Abstract:
(EN) Provided is a substrate inspection device capable of preventing inconveniencing a user in relation to the development of a test program. A prober 10 that executes a wafer-level system-level test comprises a development environment 34 for a test program, the development environment including: a user interface unit 27 for a user to edit the test program; and a test program engine 28 that compiles, executes, and debugs the test program.
(FR) L'invention concerne un dispositif d'inspection de substrat capable d'empêcher le désagrément d'un utilisateur par rapport au développement d'un programme d'essai. Un dispositif d'essai 10 qui exécute un essai niveau système au niveau tranche comprend un environnement de développement 34 pour un programme d'essai, l'environnement de développement comprenant : une unité d'interface utilisateur 27 permettant à un utilisateur d'éditer le programme d'essai; et un moteur de programme d'essai 28 qui compile, exécute et débogue le programme d'essai.
(JA) テストプログラムの開発に関してユーザに不便を強いるのを防止することができる基板検査装置を提供する。ウエハレベルシステムレベルテストを行うプローバ10は、ユーザがテストプログラムを編集するためのユーザインターフェース部27と、テストプログラムのコンパイル、実行及びデバッグを行うテストプログラムエンジン28とを有するテストプログラムの開発環境34を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)