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Pub. No.:    WO/2018/003269    International Application No.:    PCT/JP2017/016645
Publication Date: 04.01.2018 International Filing Date: 20.04.2017
Chapter 2 Demand Filed:    14.09.2017    
H01L 21/66 (2006.01), G01R 31/28 (2006.01), G06F 11/22 (2006.01), G06F 9/44 (2018.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325 (JP)
Inventors: SUGIYAMA, Katsuaki; (JP).
MITSUI, Atsuo; (JP).
KOSUGA, Yutaka; (JP).
NARIKAWA, Kenichi; (JP).
MORITA, Shingo; (JP)
Agent: BECCHAKU, Shigehisa; Lusis Bldg. 2nd Floor, 16-1, Higashi Shinbashi 2-chome, Minato-ku, Tokyo 1050021 (JP)
Priority Data:
2016-127742 28.06.2016 JP
(JA) 基板検査装置
Abstract: front page image
(EN)Provided is a substrate inspection device capable of preventing inconveniencing a user in relation to the development of a test program. A prober 10 that executes a wafer-level system-level test comprises a development environment 34 for a test program, the development environment including: a user interface unit 27 for a user to edit the test program; and a test program engine 28 that compiles, executes, and debugs the test program.
(FR)L'invention concerne un dispositif d'inspection de substrat capable d'empêcher le désagrément d'un utilisateur par rapport au développement d'un programme d'essai. Un dispositif d'essai 10 qui exécute un essai niveau système au niveau tranche comprend un environnement de développement 34 pour un programme d'essai, l'environnement de développement comprenant : une unité d'interface utilisateur 27 permettant à un utilisateur d'éditer le programme d'essai; et un moteur de programme d'essai 28 qui compile, exécute et débogue le programme d'essai.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)