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1. (WO2018003002) ACTIVE GAS-GENERATING DEVICE AND FILM FORMATION APPARATUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2018/003002 International Application No.: PCT/JP2016/069091
Publication Date: 04.01.2018 International Filing Date: 28.06.2016
IPC:
C23C 16/505 (2006.01) ,C01B 13/11 (2006.01) ,H05H 1/24 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
505
using radio frequency discharges
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
13
Oxygen; Ozone; Oxides or hydroxides in general
10
Preparation of ozone
11
by electric discharge
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
東芝三菱電機産業システム株式会社 TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION [JP/JP]; 東京都中央区京橋三丁目1番1号 3-1-1 Kyobashi, Chuo-ku, Tokyo 1040031, JP
Inventors:
西村 真一 NISHIMURA Shinichi; JP
渡辺 謙資 WATANABE Kensuke; JP
山田 義人 YAMADA Yoshihito; JP
Agent:
吉竹 英俊 YOSHITAKE Hidetoshi; JP
Priority Data:
Title (EN) ACTIVE GAS-GENERATING DEVICE AND FILM FORMATION APPARATUS
(FR) DISPOSITIF GÉNÉRATEUR DE GAZ ACTIF ET APPAREIL DE FORMATION DE FILM
(JA) 活性ガス生成装置及び成膜処理装置
Abstract:
(EN) The purpose of the present invention is to provide an active gas-generating device capable of jetting highly uniform active gas. In a central region (R51) of a dielectric electrode (21) according to the present invention, gas-jetting holes (31)-(37) and gas-jetting holes (41)-(47) are provided as three or more gas-jetting holes in the X-direction and are formed together in a two-row configuration along the X-direction. For the gas-jetting holes (31)-(37) and gas-jetting holes (41)-(47) of the two-row configuration, the gas-jetting holes (3i) and the gas-jetting holes (4i) are alternately disposed along the X-direction by providing a difference in the X-direction between the positions at which the gas-jetting hole 31 and gas-jetting hole 41 are formed.
(FR) Le but de la présente invention concerne un dispositif générateur de gaz actif pouvant projeter un gaz actif hautement uniforme. Dans une région centrale (R51) d'une électrode diélectrique (21) selon la présente invention, des trous de projection de gaz (31)-(37) et des trous de projection de gaz (41)-(47) sont disposés sous forme d'au moins trois trous de projection de gaz dans la direction X et sont formés ensemble selon une configuration à deux rangées le long de la direction X. Pour les trous de projection de gaz (31)-(37) et les trous de projection de gaz (41)-(47) de la configuration à deux rangées, les trous de projection de gaz (3i) et les trous de projection de gaz (4i) sont disposés en alternance le long de la direction X en réalisant une différence dans la direction X entre les positions dans lesquelles le trou de projection de gaz 31 et le trou de projection de gaz 41 sont formés.
(JA)  本発明は、均一性の高い活性ガスを噴出することができ活性ガス生成装置を提供することを目的とする。そして、本発明の誘電体電極(21)に関し、中央領域(R51)においてX方向に沿って、3個以上の複数のガス噴出孔として、互いにX方向に沿って2列構成で形成されるガス噴出孔(31)~(37)及びガス噴出孔(41)~(47)が設けられる。そして、ガス噴出孔31とガス噴出孔41との形成位置にX方向の差分が設けられることにより、2列構成のガス噴出孔(31)~(37)及びガス噴出孔(41)~(47)は、X方向に沿ってガス噴出孔(3i)とガス噴出孔(4i)とが交互に配置される。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020190009781CN109477220EP3476975