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1. (WO2018002566) MEMS DEVICE AND PROCESS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/002566    International Application No.:    PCT/GB2016/051974
Publication Date: 04.01.2018 International Filing Date: 30.06.2016
IPC:
H04R 19/00 (2006.01), B81B 3/00 (2006.01), B81C 1/00 (2006.01), H04R 19/04 (2006.01), H04R 31/00 (2006.01)
Applicants: CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LIMITED [GB/GB]; 7B Nightingale Way Quartermile Edinburgh EH3 9EG (GB)
Inventors: PIECHOCINSKI, Marek Sebastian; (GB).
JENKINS, Colin Robert; (GB).
GRAHAM, Clive Robert; (GB)
Agent: COOPER-ROLFE, Elizabeth; (GB)
Priority Data:
Title (EN) MEMS DEVICE AND PROCESS
(FR) DISPOSITIF MEMS ET PROCESSUS
Abstract: front page image
(EN)The application describes MEMS transducer structures- comprising a membrane structure having a flexible membrane layer and at least one electrode layer. The electrode layer is spaced from the flexible membrane layer such that at least one air volume extends between the material of the electrode layer and the membrane layer. The electrode layer is supported relative to the flexible membrane by means of a support structure which extends between the first electrode layer and the flexible membrane layer,.
(FR)L'invention concerne des structures de transducteurs MEMS comportant une structure à membrane dotée d'une couche de membrane souple et au moins une couche d'électrode. La couche d'électrode est écartée de la couche de membrane souple de telle façon qu'au moins un volume d'air s'étende entre le matériau de la couche d'électrode et la couche de membrane. La couche d'électrode est soutenue par rapport à la membrane souple au moyen d'une structure de soutien qui s'étend entre la première couche d'électrode et la couche de membrane souple.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)