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1. (WO2018001751) METHOD AND DEVICE FOR PUPIL ILLUMINATION IN OVERLAY AND CRITICAL DIMENSION SENSORS
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Pub. No.: WO/2018/001751 International Application No.: PCT/EP2017/064734
Publication Date: 04.01.2018 International Filing Date: 16.06.2017
IPC:
G03F 7/20 (2006.01) ,G01B 9/04 (2006.01) ,G01B 11/02 (2006.01) ,G01N 21/956 (2006.01) ,G01N 21/47 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9
Instruments as specified in the subgroups and characterised by the use of optical measuring means
04
Measuring microscopes
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
02
for measuring length, width, or thickness
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
956
Inspecting patterns on the surface of objects
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
17
Systems in which incident light is modified in accordance with the properties of the material investigated
47
Scattering, i.e. diffuse reflection
Applicants:
ASML HOLDING N.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
SHMAREV, Yevgeniy, Konstantinovich; US
EURLINGS, Markus, Franciscus, Antonius; NL
Agent:
SLENDERS, Peter; NL
Priority Data:
62/357,10830.06.2016US
Title (EN) METHOD AND DEVICE FOR PUPIL ILLUMINATION IN OVERLAY AND CRITICAL DIMENSION SENSORS
(FR) PROCÉDÉ ET DISPOSITIF D'ÉCLAIRAGE DE PUPILLE DANS DES CAPTEURS DE RECOUVREMENT ET DE DIMENSIONS CRITIQUES
Abstract:
(EN) An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
(FR) L'invention concerne un système d'éclairage destiné à un appareil de métrologie, capable d'obtenir une souplesse du profil spatial d'éclairage, un rapport élevé de polarisation d'extinction, et un contraste élevé. Le système d'éclairage comprend un séparateur de faisceau polarisant (PBS), un sélecteur de mode d'éclairage (IMS), et un modulateur spatial de lumière (SLM) réfléchissant. Le PBS divise un faisceau d'éclairage en sous-faisceaux. L'IMS est doté d'une pluralité d'ouvertures qui transmet au moins un sous-faisceau et peut être disposée dans des positions d'éclairage multiples correspondant à des modes d'éclairage. Une matrice de pixels du SLM réfléchissant réfléchit une partie du sous-faisceau transmis par l'IMS et le renvoie à l'IMS et au PBS. Le PBS, l'IMS et le SLM génèrent collectivement un profil spatial complexe d'amplitude ou d'intensité du sous-faisceau transmis.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)