WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2017205290) BYPASSING THE PAM REQUIREMENT OF THE CRISPR-CAS SYSTEM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/205290    International Application No.:    PCT/US2017/033835
Publication Date: 30.11.2017 International Filing Date: 22.05.2017
IPC:
A01H 1/00 (2006.01), A01K 67/00 (2006.01), A01K 67/027 (2006.01), C12N 1/15 (2006.01), C12N 1/19 (2006.01), C12N 1/21 (2006.01), C12N 5/10 (2006.01)
Applicants: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK [US/US]; 412 Low Memorial Library 535 West 116th Street New York, NY 10027 (US)
Inventors: UCUNCUOGLU, Suleyman; (US)
Agent: DAVITZ, Michael A.; (US).
CHENG, Susie; (US).
DAVITZ, Michael, A.; (US).
ELLIS, Edward, J.; (US).
KRAMER CARNEY, Bonnie; (US)
Priority Data:
62/479,109 30.03.2017 US
62/340,265 23.05.2016 US
Title (EN) BYPASSING THE PAM REQUIREMENT OF THE CRISPR-CAS SYSTEM
(FR) CONTOURNEMENT DE L'EXIGENCE PAM DU SYSTÈME CRISPR-CAS
Abstract: front page image
(EN)The present CRISPR-Cas9 systems can cleave a double-stranded DNA (dsDNA) independent of the protospacer adjacent motif (PAM). By utilizing an invader RNA (iRNA) to separate at least one portion of the dsDNA, the present system and method offer great flexibility to modify a large range of DNA targets.
(FR)La présente invention concerne des systèmes CRISPR-CaS9 pouvant cliver un ADN double brin (ADNdb) indépendant du motif PAM (protospacer adjacent motif). Grâce à l'utilisation d'un ARN envahisseur (ARNe) pour séparer au moins une partie de l'ADNdb, le système et le procédé selon la présente invention offrent une grande souplesse pour modifier un large éventail d'ADN cibles.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)