WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2017205272) HARD-MASK COMPOSITION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/205272    International Application No.:    PCT/US2017/033802
Publication Date: 30.11.2017 International Filing Date: 22.05.2017
IPC:
C01B 32/156 (2017.01), C08K 9/04 (2006.01), C09C 3/08 (2006.01), C09D 161/14 (2006.01), H01L 21/00 (2006.01), H01L 21/02 (2006.01)
Applicants: R0BINSON, Alex, Philip, Graham [GB/GB]; (GB).
LADA, Thomas [US/US]; (US).
ROTH, John, L. [US/US]; (US).
BROWN, Alan [GB/GB]; (GB).
FROMMHOLD, Andreas [DE/DE]; (DE).
JACKSON, Edward, A. [US/US]; (US)
Inventors: R0BINSON, Alex, Philip, Graham; (GB).
LADA, Thomas; (US).
ROTH, John, L.; (US).
BROWN, Alan; (GB).
FROMMHOLD, Andreas; (DE).
JACKSON, Edward, A.; (US)
Agent: SHELNUT, James, G.; (US)
Priority Data:
15/164,801 25.05.2016 US
Title (EN) HARD-MASK COMPOSITION
(FR) COMPOSITION POUR MASQUE DUR
Abstract: front page image
(EN)Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
(FR)L'invention concerne une composition destinée à former un masque dur déposé par rotation comprenant un dérivé de fullerène et un agent de réticulation. La présente invention concerne en outre un procédé de formation d'un masque dur.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)