WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2017204167) ALKALI-FREE GLASS SUBSTRATE, LAMINATED SUBSTRATE, AND METHOD FOR MANUFACTURING GLASS SUBSTRATE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/204167    International Application No.:    PCT/JP2017/019069
Publication Date: 30.11.2017 International Filing Date: 22.05.2017
IPC:
C03C 3/091 (2006.01), C03C 3/093 (2006.01), H01L 23/15 (2006.01)
Applicants: ASAHI GLASS COMPANY, LIMITED [JP/JP]; 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405 (JP)
Inventors: NOMURA Shuhei; (JP).
ONO Kazutaka; (JP)
Agent: EIKOH PATENT FIRM, P.C.; Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2016-104652 25.05.2016 JP
2016-154685 05.08.2016 JP
Title (EN) ALKALI-FREE GLASS SUBSTRATE, LAMINATED SUBSTRATE, AND METHOD FOR MANUFACTURING GLASS SUBSTRATE
(FR) SUBSTRAT EN VERRE SANS ALCALI, SUBSTRAT STRATIFIÉ ET PROCÉDÉ DE FABRICATION DE SUBSTRAT EN VERRE
(JA) 無アルカリガラス基板、積層基板、およびガラス基板の製造方法
Abstract: front page image
(EN)Provided is an alkali-free glass substrate which has a high grinding rate and in which less residual strain is generated in a silicon substrate in a heat treatment process for bonding the silicon substrate and a glass substrate. This alkali-free glass substrate contains, in mol% on an oxide basis, 11.0% or more of Al2O3, 8.0% or more of B2O3, and 1% or more of SrO, and has an average coefficient of thermal expansion α100/200 at 100 to 200°C of 3.10 to 3.70 ppm/°C, a Young's modulus of 76.0 GPa or less, and a density of 2.42 g/cm3 or more.
(FR)L'invention concerne un substrat en verre sans alcali qui a une vitesse de dégrossissage élevée, et qui permet de générer une contrainte résiduelle inférieure dans un substrat de silicium lors d'un processus de traitement thermique permettant de lier ledit substrat de silicium à un substrat en verre. Ledit substrat en verre sans alcali contient, en % en mole des oxydes, 11,0 % d'Al2O3, 8,0 % ou plus de B2O3 et 1 % ou plus de SrO, et présente un coefficient moyen de dilatation thermique α100/200 à 100 à 200 °C de 3,10 à 3,70 ppm/°C, un module de Young de 76,0 GPa ou moins, et une densité de 2,42 g/cm3 ou plus.
(JA)本発明は、研削レートが高く、且つシリコン基板とガラス基板を貼り合わせる熱処理工程において前記シリコン基板に発生する残留歪が小さい無アルカリガラス基板を提供する。本発明の無アルカリガラス基板は、酸化物基準のモル百分率表示でAlを11.0%以上、Bを8.0%以上、SrOを1%以上含有し、且つ100℃~200℃での平均熱膨張係数α100/200が3.10ppm/℃~3.70ppm/℃、ヤング率が76.0GPa以下、密度が2.42g/cm以上である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)