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1. (WO2017203144) THIN LAYER DEPOSITION PROCESS

Pub. No.:    WO/2017/203144    International Application No.:    PCT/FR2017/051243
Publication Date: Fri Dec 01 00:59:59 CET 2017 International Filing Date: Tue May 23 01:59:59 CEST 2017
IPC: C23C 14/56
C23C 14/58
C23C 14/18
C03C 17/00
C03C 17/245
C23C 14/02
G02B 27/00
Applicants: SAINT-GOBAIN GLASS FRANCE
Inventors: WANAKULE, Nisita
MAGNE, Constance
BOTTOIS, Clément
Title: THIN LAYER DEPOSITION PROCESS
Abstract:
The invention relates to a process for obtaining a material comprising a substrate coated with a photocatalytic coating, said process comprising a step of depositing by cathode sputtering on said substrate a stack of thin layers successively comprising a first layer of metallic titanium having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of metallic titanium having a thickness of from 2 to 5 nm; and a step of oxidation using a laser radiation heat treatment, in which the stack is in contact with an oxidizing atmosphere.