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|1. (WO2017203144) THIN LAYER DEPOSITION PROCESS|
|Applicants:||SAINT-GOBAIN GLASS FRANCE
|Title:||THIN LAYER DEPOSITION PROCESS|
The invention relates to a process for obtaining a material comprising a substrate coated with a photocatalytic coating, said process comprising a step of depositing by cathode sputtering on said substrate a stack of thin layers successively comprising a first layer of metallic titanium having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of metallic titanium having a thickness of from 2 to 5 nm; and a step of oxidation using a laser radiation heat treatment, in which the stack is in contact with an oxidizing atmosphere.