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1. (WO2017203063) PREPARATION OF POROUS SILICON (99.99%) BY ELECTRO-OXYDATION OF METALLURGICAL GRADE SILICON
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/203063 International Application No.: PCT/EP2017/062915
Publication Date: 30.11.2017 International Filing Date: 29.05.2017
IPC:
C01B 33/037 (2006.01) ,C25F 3/12 (2006.01) ,H01M 4/38 (2006.01)
Applicants: UNIVERSITE DE RENNES 1[FR/FR]; 2, rue du Thabor 35000 RENNES, FR
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)[FR/FR]; 3, rue Michel Ange 75016 PARIS, FR
Inventors: JOUIKOV, Viatcheslav; FR
ZIZUMBO-LOPEZ, Arturo; MX
Agent: REGIMBEAU; 20, rue de Chazelles 75847 PARIS CEDEX 17, FR
Priority Data:
16305617.927.05.2016EP
Title (EN) PREPARATION OF POROUS SILICON (99.99%) BY ELECTRO-OXYDATION OF METALLURGICAL GRADE SILICON
(FR) PRÉPARATION DE SILICIUM POREUX (99,99 %) PAR ÉLECTRO-OXYDATION DE SILICIUM MÉTALLURGIQUE
Abstract:
(EN) The invention relates to an electrochemical etching process for the enrichment and preparation of porous silicon by anodic etching of any starting metallurgical grade silicon pieces with a minimum67.7 At% Si content in an anhydrous aprotic organic solvent containing a dissolved tertiary ammonium salt resulting from the corresponding amine and a mineral acid as supporting electrolyte.
(FR) L'invention concerne un procédé de gravure électrochimique pour l'enrichissement et la préparation de silicium poreux par gravure anodique de n'importe quelle pièce initiale de silicium métallurgique ayant une teneur minimale en Si de 67,7 % atomique dans un solvant organique aprotique anhydre contenant un sel d'ammonium tertiaire dissous, ce qui donne l'amine correspondante et un acide minéral en tant qu'électrolyte de support.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)