WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2017200219) PIEZO MEMS MICROPHONE AND MANUFACTURING METHOD THEREFOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/200219 International Application No.: PCT/KR2017/004346
Publication Date: 23.11.2017 International Filing Date: 25.04.2017
IPC:
H04R 17/02 (2006.01) ,H04R 1/28 (2006.01) ,H04R 7/02 (2006.01) ,H04R 31/00 (2006.01)
Applicants: SOST CO.,LTD.[KR/KR]; 16, Barangongdan-ro 3-gi Hyangnam-eup Hwaseong-si Gyeonggi-do 18623, KR
Inventors: LEE, Jea Hyoung; KR
Agent: KIM, In Cheol; KR
Priority Data:
10-2016-006213420.05.2016KR
Title (EN) PIEZO MEMS MICROPHONE AND MANUFACTURING METHOD THEREFOR
(FR) MICROPHONE MEMS PIÉZOÉLECTRIQUE ET PROCÉDÉ DE FABRICATION DE CELUI-CI
(KO) 피에조 멤스 마이크로폰 및 그 제조방법
Abstract: front page image
(EN) The present invention relates to a piezo MEMS microphone and a manufacturing method therefor, the microphone comprising: a substrate having a sound chamber formed in a central lower part thereof; a diaphragm formed at an upper part and having at least one venthole in a central part thereof; a ring-shaped lower electrode formed on the outermost circumference of the diaphragm; a ring-shaped piezoelectric element formed at an upper part of the lower electrode; and an upper electrode formed at an upper part of the piezoelectric element. The present invention provides: the piezo MEMS microphone, which, unlike in a conventional technique, improves a signal to noise ratio (SNR) by arranging the piezoelectric element on the outer circumference of the diaphragm, is easy to manufacture, can reduce unit cost, and has improved SNR and performance; and the manufacturing method therefor.
(FR) La présente invention concerne un microphone MEMS piézoélectrique et un procédé de fabrication de celui-ci, le microphone comprenant : un substrat comportant une chambre acoustique formée dans une partie inférieure centrale de celui-ci ; une membrane formée au niveau d'une partie supérieure et comportant au moins un évent dans une partie centrale de celle-ci ; une électrode inférieure en forme de bague formée sur la circonférence la plus à l'extérieur de la membrane ; un élément piézoélectrique en forme de bague formé au niveau d'une partie supérieure de l'électrode inférieure ; et une électrode supérieure formée au niveau d'une partie supérieure de l'élément piézoélectrique. La présente invention concerne : le microphone MEMS piézoélectrique, qui, contrairement à une technique classique, améliore un rapport signal sur bruit (SNR) en agençant l'élément piézoélectrique sur la circonférence extérieure de la membrane, est facile à fabriquer, peut réduire le coût unitaire, et a un SNR et une performance améliorés ; et le procédé de fabrication de celui-ci.
(KO) 본 발명은 피에조 멤스 마이크로폰 및 그 제조방법에 관한 것으로, 중심 하부에 음향챔버가 형성된 기판; 상부에 형성되는 것으로, 중심부에 적어도 하나의 벤트홀(venthole)이 형성된 진동판; 상기 진동판 가장자리 둘레에 형성되는 링 형상의 하부전극; 하부전극 상부에 형성되는 링 형상의 압전소자; 및 압전소자 상부에 형성되는 상부전극을 포함한다. 이와 같은 본 발명은, 종래의 기술과 달리 압전소자를 진동판의 외곽 둘레에 배치하여 신호대잡음비(SNR)를 향상시키고, 제조가 용이하고 단가를 낮출 수 있으며, 신호대잡음비(SNR) 및 성능이 향상된 피에조 멤스 마이크로폰 및 그 제조방법을 제공한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)