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1. (WO2017199768) RESIST UNDERLAYER FILM FORMING COMPOSITION

Pub. No.:    WO/2017/199768    International Application No.:    PCT/JP2017/017272
Publication Date: Fri Nov 24 00:59:59 CET 2017 International Filing Date: Wed May 03 01:59:59 CEST 2017
IPC: G03F 7/11
C08G 8/00
G03F 7/16
H01L 21/027
Applicants: NISSAN CHEMICAL CORPORATION
日産化学株式会社
Inventors: NISHIMAKI, Hirokazu
西巻 裕和
HASHIMOTO, Keisuke
橋本 圭祐
SAKAMOTO, Rikimaru
坂本 力丸
Title: RESIST UNDERLAYER FILM FORMING COMPOSITION
Abstract:
[Problem] To provide a novel resist underlayer film forming composition. [Solution] A resist underlayer film forming composition which contains a solvent and a polymer having a repeating structural unit that is represented by formula (1a) and/or formula (1b). (In formulae (1a) and (1b), each of two R1 moieties independently represents an alkyl group, an alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group or an amino group; each of two R2 moieties independently represents a hydrogen atom, an alkyl group, an alkenyl group, an acetal group, an acyl group or a glycidyl group; R3 represents an optionally substituted aromatic hydrocarbon group or a heterocyclic group; R4 represents a hydrogen atom, a phenyl group or a naphthyl group; each of two subscripts k independently represents 0 or 1; m represents an integer of 3 to 500; p represents an integer of 3 to 500; and X represents a benzene ring, and two -C(CH3)2- groups bonded to the benzene ring are at the meta position or the para position.)