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1. (WO2017198819) METHOD AND FORMULATION FOR IMPREGNATION OF POROUS MATERIALS
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Pub. No.: WO/2017/198819 International Application No.: PCT/EP2017/062111
Publication Date: 23.11.2017 International Filing Date: 19.05.2017
Chapter 2 Demand Filed: 14.03.2018
IPC:
C09D 4/00 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
4
Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
Applicants:
SICPA HOLDING SA [CH/CH]; Avenue de Florissant 41 1008 Prilly, CH
Inventors:
CIAMPINI, Davide; IT
Agent:
CARVAJAL Y URQUIJO, Isabel; c/o Clarke, Modet & Co. C/ Suero de Quiñones 34-36 28002 Madrid, ES
Priority Data:
16170329.319.05.2016EP
Title (EN) METHOD AND FORMULATION FOR IMPREGNATION OF POROUS MATERIALS
(FR) PROCÉDÉ ET FORMULATION POUR L'IMPRÉGNATION DE MATÉRIAUX POREUX
Abstract:
(EN) The present invention relates to formulations for impregnating a porous sintered material and the use as well as methods for impregnating a porous sintered material. More specifically, the present invention relates to formulations for impregnating a porous sintered material, said formulation comprising 40-90 wt.-% of an acrylic monomer, 0.1-10 wt.-% of a radicalic thermal initiator, 0.1-10 wt.-% of a radicalic photoinitiator, 0-30 wt.-% of an organosilane adhesion promoter and 0-5 wt.-% of a siliconic surfactant. Further the invention relates also to a method for impregnating a porous sintered material, comprising the steps of dipping the porous material into a liquid formulation comprising an acrylic monomer; a radicalic thermal initiator; and a radicalic photoinitiator; vacuum treating of the dipped porous material; removing of excess liquid from the surface of the porous material; exposing of the porous material to light radiation; and heat treating of the porous material.
(FR) L'invention concerne des formulations servant à imprégner un matériau fritté poreux, ainsi que l'utilusation de ces formulations et des procédés d'imprégnation de matériau fritté poreux. L'invention concerne plus particulièrement des formulations servant à imprégner un matériau fritté poreux, comprenant de 40 à 90% en poids d'un monomère acrylique, de 0,1 à 10% en poids d'un amorceur thermique radicalaire, de 0,1 à 10% en poids d'un photoinitiateur radicalaire, de 0 à 30% en poids d'un promoteur d'adhérence organosilane et de 0 à 5% en poids d'un tensioactif siliconé. L'invention concerne également un procédé d'imprégnation d'un matériau fritté poreux, comprenant les étapes consistant à tremper le matériau poreux dans une formulation liquide contenant un monomère acrylique, un amorceur thermique radicalaire et un photoinitiateur radicalaire; à traiter sous vide le matériau poreux trempé; à éliminer l'excédent de liquide de la surface du matériau poreux; à exposer le matériau poreux à un rayonnement lumineux; et à traiter thermiquement le matériau poreux.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)