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1. (WO2017197936) SUBSTRATE, EDGING DETECTION METHOD AND DEVICE THEREFOR, AND POSITIONING METHOD AND DEVICE THEREFOR, EXPOSURE MACHINE, AND EVAPORATION EQUIPMENT
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Pub. No.: WO/2017/197936 International Application No.: PCT/CN2017/073758
Publication Date: 23.11.2017 International Filing Date: 16.02.2017
IPC:
B24B 9/10 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
9
Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
02
characterised by a special design with respect to properties of materials specific to articles to be ground
06
of non-metallic inorganic material, e.g. stone, ceramics, porcelain
08
of glass
10
of plate glass
Applicants: BOE TECHNOLOGY GROUP CO., LTD.[CN/CN]; No. 10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.[CN/CN]; Ordos Equipment Manufacturing Base, Dongsheng District Ordos, Inner Mongolia 017020, CN
Inventors: WANG, Qiang; CN
LIU, Libin; CN
Agent: DRAGON INTELLECTUAL PROPERTY LAW FIRM; 10F, Bldg. 2, Maples International Center No. 32 Xizhimen North Street, Haidian District Beijing 100082, CN
Priority Data:
201610342023.X20.05.2016CN
Title (EN) SUBSTRATE, EDGING DETECTION METHOD AND DEVICE THEREFOR, AND POSITIONING METHOD AND DEVICE THEREFOR, EXPOSURE MACHINE, AND EVAPORATION EQUIPMENT
(FR) SUBSTRAT, PROCÉDÉ ET DISPOSITIF DE DÉTECTION DE BORDURE CORRESPONDANTS, ET PROCÉDÉ ET DISPOSITIF DE POSITIONNEMENT CORRESPONDANTS, MACHINE D'EXPOSITION ET ÉQUIPEMENT D'ÉVAPORATION
(ZH) 基板及其磨边检测方法和装置、定位方法和装置、曝光机以及蒸镀设备
Abstract:
(EN) A substrate, comprising: a base substrate (101) and at least one edging detection pattern (102) provided on the base substrate (101). The edging detection pattern (102) is made of a conductive material and provided at an edge of the base substrate (101). Also provided are an edging detection method and device for the substrate, a positioning method and device for the substrate, an exposure machine, and evaporation equipment.
(FR) L'invention concerne un substrat comprenant : un substrat de base (101) et au moins un motif de détection de bordure (102) disposé sur le substrat de base (101). Le motif de détection de bordure (102) est composé d'un matériau conducteur et disposé au niveau d'un bord du substrat de base (101). L'invention concerne également un procédé et un dispositif de détection de bordure pour le substrat, un procédé et un dispositif de positionnement pour le substrat, une machine d'exposition et un équipement d'évaporation.
(ZH) 一种基板,包括:衬底基板(101)以及设置在衬底基板(101)上的至少一个磨边检测图形(102),磨边检测图形(102)采用导电材料制成,设置于衬底基板(101)的边缘。还提供了基板的磨边检测方法和装置、定位方法和装置、曝光机以及蒸镀设备。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)