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1. (WO2017196010) CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION

Pub. No.:    WO/2017/196010    International Application No.:    PCT/KR2017/004451
Publication Date: Fri Nov 17 00:59:59 CET 2017 International Filing Date: Thu Apr 27 01:59:59 CEST 2017
IPC: G03F 7/038
G03F 7/004
Applicants: YOUNG CHANG CHEMICAL CO., LTD
영창케미칼 주식회사
Inventors: LEE, Seung Hun
이승훈
LEE, Seung Hyun
이승현
LEE, Su Jin
이수진
CHOI, Young Cheol
최영철
Title: CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION
Abstract:
The present invention relates to a chemically-amplified-type negative photoresist composition and, more particularly, to a chemically-amplified-type negative photoresist composition suitable for an application to a semiconductor process, which comprises a specific organic acid additive, thereby improving a process margin in a short-wavelength exposure source compared to conventional negative-type photoresists.