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1. (WO2017195894) METHOD FOR PRODUCING 2-ACETYLPYRIDINE COMPOUND
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/195894 International Application No.: PCT/JP2017/018068
Publication Date: 16.11.2017 International Filing Date: 12.05.2017
IPC:
C07D 213/61 (2006.01) ,C07D 213/50 (2006.01) ,C07B 61/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
213
Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02
having three double bonds between ring members or between ring members and non-ring members
04
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
60
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
61
Halogen atoms or nitro radicals
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
213
Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02
having three double bonds between ring members or between ring members and non-ring members
04
having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
24
with substituted hydrocarbon radicals attached to ring carbon atoms
44
Radicals substituted by doubly-bound oxygen, sulfur, or nitrogen atoms, or by two such atoms singly-bound to the same carbon atom
46
Oxygen atoms
50
Ketonic radicals
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
B
GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
61
Other general methods
Applicants: NISSAN CHEMICAL CORPORATION[JP/JP]; 5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo 1036119, JP
Inventors: UTSUNOMIYA Tomohisa; JP
NAKAMURA Toshiyuki; JP
NAKAYAMA Yosuke; JP
KUSUOKA Yoshiyuki; JP
Agent: SENMYO Kenji; JP
OGAWA Toshiharu; JP
Priority Data:
2016-09735313.05.2016JP
Title (EN) METHOD FOR PRODUCING 2-ACETYLPYRIDINE COMPOUND
(FR) PROCÉDÉ DE PRODUCTION D'UN COMPOSÉ DE TYPE 2-ACÉTYLPYRIDINE
(JA) 2-アセチルピリジン化合物の製造方法
Abstract:
(EN) Provided is an industrial and safe method for producing a 2-acetylpyridine compound. A method for producing a 2-acetylpyridine compound represented by formula (4) by hydrolyzing a compound represented by formula (3), said compound being obtained by reacting a 2-chloropyridine compound represented by formula (1) and a vinyl ether compound represented by formula (2) with each other. (In the formulae, each of X and Y independently represents a hydrogen atom, a halogen atom, a cyano group, a nitro group, a C1-C6 alkyl group, a halo(C1-C6)alkyl group or the like; and R represents a C1-C8 alkyl group or the like.)
(FR) L'invention concerne un procédé industriel et sûr de production d'un composé de type 2-acétylpyridine. L'invention porte sur un procédé de production d'un composé de type 2-acétylpyridine représenté par la formule (4) par hydrolyse d'un composé représenté par la formule (3), ledit composé étant obtenu par réaction d'un composé de type 2-chloropyridine représenté par la formule (1) et d'un composé de type éther de vinyle représenté par la formule (2) l'un avec l'autre. (Dans les formules, chacun parmi X et Y représente, indépendamment, un atome d'hydrogène, un atome d'halogène, un groupe cyano, un groupe nitro, un groupe C1-C6-alkyle, un groupe halogéno-(C1-C6)alkyle ou analogue ; et R représente un groupe C1-C8-alkyle ou analogue.)
(JA) 工業的かつ安全な2-アセチルピリジン化合物の製造方法を提供する。 式(1)で表される2-クロロピリジン化合物と、式(2)で表されるビニルエーテル化合物とを反応させることで得られる式(3)で表される化合物を、加水分解することによる、式(4)で表される2-アセチルピリジン化合物の製造方法。 [式中、X及びYは各々独立して水素原子、ハロゲン原子、シアノ、ニトロ、C~Cアルキル、ハロ(C~C)アルキル等を表し、RはC~Cアルキル等を表す。]
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)