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Pub. No.:    WO/2017/195875    International Application No.:    PCT/JP2017/017945
Publication Date: 16.11.2017 International Filing Date: 11.05.2017
A61K 31/421 (2006.01), A61K 31/422 (2006.01), A61K 31/426 (2006.01), A61K 31/427 (2006.01), A61P 17/02 (2006.01), A61P 43/00 (2006.01)
Applicants: NIPPON CHEMIPHAR CO., LTD. [JP/JP]; 2-3, 2-Chome, Iwamoto-cho, Chiyoda-ku Tokyo 1010032 (JP)
Inventors: HIRAI Toshitake; (JP).
HAMANO Takaichi; (JP).
Agent: HASHIMOTO Satoshi; (JP).
CHIGUSA Shinichi; (JP)
Priority Data:
2016-095793 12.05.2016 JP
(JA) 創傷治療剤
Abstract: front page image
(EN)Provided is a wound-healing agent that utilizes a benzisoxazole compound represented by general formula (I) having a PPARδ agonistic action, a tautomer or stereoisomer of the compound, or a pharmaceutically acceptable salt of these or a solvate of these, or the like.
(FR)L'invention concerne un agent de cicatrisation qui utilise un composé de benzisoxazole représenté par la formule générale (I) ayant une action agoniste de PPARδ, un tautomère ou un stéréoisomère du composé, ou un sel pharmaceutiquement acceptable de ceux-ci ou un solvate de ceux-ci, ou analogue.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)