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1. (WO2017195810) PHASE DIFFERENCE ELEMENT, PHASE DIFFERENCE ELEMENT MANUFACTURING METHOD, AND OPTICAL MEMBER
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Pub. No.: WO/2017/195810 International Application No.: PCT/JP2017/017644
Publication Date: 16.11.2017 International Filing Date: 10.05.2017
IPC:
G02B 5/30 (2006.01) ,G02F 1/1335 (2006.01) ,G02F 1/13363 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
30
Polarising elements
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
[IPC code unknown for ERROR IPC Code incorrect: invalid subgroup (0=>999999)!]
Applicants:
SCIVAX株式会社 SCIVAX CORPORATION [JP/JP]; 神奈川県川崎市幸区新川崎7番7号 7-7 Shinkawasaki, Saiwai-ku, Kawasaki-shi Kanagawa 2120032, JP
Inventors:
縄田晃史 NAWATA Akifumi; JP
粟屋信義 AWAYA Nobuyoshi; JP
田中覚 TANAKA Satoru; JP
Agent:
奥田律次 OKUDA Noritsugu; JP
Priority Data:
2016-09535111.05.2016JP
Title (EN) PHASE DIFFERENCE ELEMENT, PHASE DIFFERENCE ELEMENT MANUFACTURING METHOD, AND OPTICAL MEMBER
(FR) ÉLÉMENT DE DÉPHASAGE, PROCÉDÉ DE FABRICATION D'UN ÉLÉMENT DE DÉPHASAGE ET ÉLÉMENT OPTIQUE
(JA) 位相差素子、位相差素子製造方法および光学部材
Abstract:
(EN) The purpose of the present invention is to provide: a phase difference element that has high ellipticity and high transmittance and that is easily machined; a phase difference element manufacturing method; and an optical element that uses the phase difference element. A phase difference element 10 for controlling the optical characteristics of an incident electromagnetic wave is provided with: a metal part in which linear metal structures 1 having widths smaller than the wavelength of the electromagnetic wave are periodically arranged in parallel; and a dielectric part 2 that supports the metal structures 1 and that comprises a dielectric body through which electromagnetic waves can pass.
(FR) Le but de la présente invention est de proposer : un élément de déphasage qui présente une ellipticité élevée et une transmittance élevée et qui est facilement usiné ; un procédé de fabrication d'un élément de déphasage ; et un élément optique qui utilise l'élément de déphasage. Un élément de déphasage (10) servant à contrôler les caractéristiques optiques d'une onde électromagnétique incidente est doté : d'une partie métallique dans laquelle des structures métalliques linéaires (1) présentant des largeurs inférieures à la longueur d'onde de l'onde électromagnétique sont périodiquement disposées en parallèle ; et d'une partie diélectrique (2) qui soutient les structures métalliques (1) et qui comprend un corps diélectrique à travers lequel peuvent passer des ondes électromagnétiques.
(JA) 楕円率や透過率が高く、加工の容易な位相差素子、位相差素子製造方法および当該位相差素子を用いた光学素子を提供することを目的とする。入射した電磁波の光学特性を制御するための位相差素子10であって、電磁波の波長より小さい幅を有する直線状の金属構造体1を平行に周期配列した金属部と、電磁波を透過可能な誘電体からなり、金属構造体1を支持する誘電体部2と、を具備する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)