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1. (WO2017195586) CURABLE COMPOSITION FOR PHOTOIMPRINTING AND PATTERN TRANSFER METHOD USING SAME

Pub. No.:    WO/2017/195586    International Application No.:    PCT/JP2017/016300
Publication Date: Fri Nov 17 00:59:59 CET 2017 International Filing Date: Wed Apr 26 01:59:59 CEST 2017
IPC: C08F 2/46
B29C 59/02
C08F 299/08
H01L 21/027
Applicants: DIC CORPORATION
DIC株式会社
Inventors: IBE Takeshi
伊部 武史
YADA Makoto
矢田 真
Title: CURABLE COMPOSITION FOR PHOTOIMPRINTING AND PATTERN TRANSFER METHOD USING SAME
Abstract:
The present invention address the problem of providing a curable composition for photoimprinting that contains a polymerizable compound containing a silicon atom such as a polysiloxane and has excellent adhesion to a substrate and release property in a fine pattern mold, as well as very little mold contamination. The problem is solved by providing a curable composition for photoimprinting including a polymerizable compound containing a silicon atom in the molecule (A), a photopolymerization initiator (B), and an additive (C), the curable composition for photoimprinting being characterized in that the additive (C) is a compound represented by formula (C1) or formula (C2) [In formula (C1), R1 is a C12-30 alkyl group, X1 is a hydrogen atom or acyl group, and n is an integer of 0-50. In formula (C2), X2 and X3 are each independently a hydrogen atom or acyl group, and p, q, and r are each independently an integer of 1-50.].