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1. (WO2017195311) BAKING DEVICE AND BAKING METHOD FOR CYLINDRICAL SPUTTERING TARGET MATERIAL
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/195311 International Application No.: PCT/JP2016/064097
Publication Date: 16.11.2017 International Filing Date: 12.05.2016
IPC:
C23C 14/34 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
Applicants: HIROCHIKU CO.,LTD[JP/JP]; 10-11Seimondoori 4 chome, Hirohata-ku,Himeji-shi Hyogo 6711116, JP
Inventors: KUBOTA Yoshiaki; JP
MORIOKA Toshihiro; JP
Agent: AKETA Kan; JP
Priority Data:
Title (EN) BAKING DEVICE AND BAKING METHOD FOR CYLINDRICAL SPUTTERING TARGET MATERIAL
(FR) DISPOSITIF DE CUISSON ET PROCÉDÉ DE CUISSON POUR MATÉRIAU DE CIBLE DE PULVÉRISATION CYLINDRIQUE
(JA) 円筒形スパッタリングターゲット材の焼成装置及び焼成方法
Abstract:
(EN) [Problem] The present invention addresses the problem of providing a baking device for manufacturing an elongated cylindrical sputtering target which is used to manufacture, via sputtering, a transparent conductive film used in a liquid crystal display device, a solar cell, and the like. [Solution] The present invention is characterized by being provided with: a fixed hearth where a member to be baked of the elongated cylindrical sputtering target material is placed upright; a baking furnace body centered around the fixed hearth and having on furnace walls a plurality of heaters and an oxygen inflow port; and a mechanism whereby the baking furnace body is placed on a traveling truck and can travel by rail between a baking position and a standby position, the mechanism further opening and closing a furnace seal between the bottom of the baking furnace and the fixed hearth.
(FR) Le problème décrit par la présente invention porte sur un dispositif de cuisson pour fabriquer une cible de pulvérisation cylindrique allongée qui est utilisée pour la fabrication, par pulvérisation, d'un film conducteur transparent utilisé dans un dispositif d'affichage à cristaux liquides, une cellule solaire et analogue. La solution selon la présente invention est caractérisée en ce qu'elle comporte : un foyer fixe dans lequel un élément à cuire du matériau de cible de pulvérisation cylindrique allongée est placé verticalement; un corps de four de cuisson centré autour du foyer fixe et présentant, sur les parois du four, une pluralité de chauffages et un orifice d'entrée d'oxygène; et un mécanisme grâce auquel le corps du four de cuisson est placé sur un chariot mobile et peut se déplacer par rail entre une position de cuisson et une position d'attente, le mécanisme ouvrant et fermant en outre une fermeture étanche de four entre le fond du four de cuisson et le foyer fixe.
(JA) 【課題】本発明は、液晶表示素子や太陽電池などに用いられる透明導電膜をスパッタリング法で製作する場合に用いられる長尺物の円筒形スパッタリングターゲットを製造する焼成装置を提供する。 【解決手段】長尺物の円筒形スパッタリングターゲット材の被焼成体を直立した状態で載置する固定炉床と、固定炉床を中心に配置され、炉内壁面に複数段の加熱ヒータと酸素流入口を設けた焼成炉本体と、焼成炉本体を走行台車上に載置しており、焼成炉本体が焼成位置と待避位置との間の軌条走行を可能にし、また、焼成炉の下部と固定炉床との間に炉シールを開閉する機構を設けたことを特徴とする。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)