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1. (WO2017193653) SUBSTRATE PROCESSING EQUIPMENT

Pub. No.:    WO/2017/193653    International Application No.:    PCT/CN2017/073046
Publication Date: Fri Nov 17 00:59:59 CET 2017 International Filing Date: Wed Feb 08 00:59:59 CET 2017
IPC: H01L 21/67
G02F 1/1333
Applicants: BOE TECHNOLOGY GROUP CO., LTD.
京东方科技集团股份有限公司
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
合肥鑫晟光电科技有限公司
Inventors: LIU, Xiaoning
刘小宁
WANG, Shikai
王世凯
KIM, Dongseob
金童燮
GENG, Jun
耿军
HU, Zhen
胡臻
LIANG, Xuanqi
梁渲祺
ZHANG, Feng
张沣
HUANG, Tengfei
黄腾飞
PAN, Yang
潘洋
JIANG, Zhongren
蒋中任
Title: SUBSTRATE PROCESSING EQUIPMENT
Abstract:
Substrate processing equipment comprises an etching space. The substrate processing equipment is characterized in that one or more fume suctioning devices (7) is disposed outside a substrate entrance region (1), and the equipment comprises one or more spraying tubes. The fume suctioning devices (7) can suction from the etching space fumes of an etching solution, thereby reducing damage caused by the fumes to the other substrate processing components.