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|1. (WO2017193653) SUBSTRATE PROCESSING EQUIPMENT|
|Applicants:||BOE TECHNOLOGY GROUP CO., LTD.
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
|Title:||SUBSTRATE PROCESSING EQUIPMENT|
Substrate processing equipment comprises an etching space. The substrate processing equipment is characterized in that one or more fume suctioning devices (7) is disposed outside a substrate entrance region (1), and the equipment comprises one or more spraying tubes. The fume suctioning devices (7) can suction from the etching space fumes of an etching solution, thereby reducing damage caused by the fumes to the other substrate processing components.