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1. (WO2017192980) SELECTIVE DEPOSITION THROUGH FORMATION OF SELF-ASSEMBLED MONOLAYERS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/192980    International Application No.:    PCT/US2017/031285
Publication Date: 09.11.2017 International Filing Date: 05.05.2017
IPC:
H01L 21/027 (2006.01), H01L 21/311 (2006.01), H01L 21/02 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054 (US)
Inventors: KACHIAN, Jessica Sevanne; (US).
KAUFMAN-OSBORN, Tobin; (US).
THOMPSON, David; (US)
Agent: BLANKMAN, Jeffrey I.; (US)
Priority Data:
62/332,524 06.05.2016 US
Title (EN) SELECTIVE DEPOSITION THROUGH FORMATION OF SELF-ASSEMBLED MONOLAYERS
(FR) DÉPÔT SÉLECTIF PAR FORMATION DE MONOCOUCHES AUTO-ASSEMBLÉES
Abstract: front page image
(EN)Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include net chemisorption of a self-assembled monolayer on the second surface to prevent deposition of the film on the second surface.
(FR)L'invention concerne des procédés de dépôt d'un film de façon sélective sur une première surface de substrat par rapport à une seconde surface de substrat. Les procédés comprennent la chimisorption nette d'une monocouche auto-assemblée sur la seconde surface pour empêcher le dépôt du film sur la seconde surface.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)