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1. (WO2017192834) WAFER-BASED CHARGED PARTICLE ACCELERATOR, WAFER COMPONENTS, METHODS, AND APPLICATIONS

Pub. No.:    WO/2017/192834    International Application No.:    PCT/US2017/031029
Publication Date: Fri Nov 10 00:59:59 CET 2017 International Filing Date: Fri May 05 01:59:59 CEST 2017
IPC: H05H 13/00
H05H 7/08
Applicants: CORNELL UNIVERSITY
Inventors: LAL, Amit
SCHENKEL, Thomas
PERSAUD, Arun
JI, Qing
SEIDL, Peter
WALDRON, Will
ARDANUC, Serhan
KADAYRA BASAVARAJAPPA, Vinaya, Kumar
Title: WAFER-BASED CHARGED PARTICLE ACCELERATOR, WAFER COMPONENTS, METHODS, AND APPLICATIONS
Abstract:
A wafer-based charged particle accelerator includes a charged particle source and at least one RF charged particle accelerator wafer sub-assembly and a power supply coupled to the at least one RF charged particle accelerator wafer sub-assembly. The wafer-based charged particle accelerator may further include a beam current-sensor. The wafer-based charged particle accelerator may further include at least a second RF charged particle accelerator wafer sub-assembly and at least one ESQ charged particle focusing wafer. Fabrication methods are disclosed for RF charged particle accelerator wafer sub-assemblies, ESQ charged particle focusing wafers, and the wafer-based charged particle accelerator.