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1. (WO2017190599) METHOD FOR PRODUCING ACRYLIC ESTER WITH LOW POLLUTANT DISCHARGE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/190599    International Application No.:    PCT/CN2017/081430
Publication Date: 09.11.2017 International Filing Date: 21.04.2017
IPC:
C07C 67/08 (2006.01), C07C 67/48 (2006.01), C07C 67/54 (2006.01), C07C 69/54 (2006.01)
Applicants: CHINESE RESEARCH ACADEMY OF ENVIRONMENTAL SCIENCES [CN/CN]; No.8 Anwai Beiyuan Dayangfang, Chaoyang District Beijing 100012 (CN)
Inventors: ZHOU, Yuexi; (CN).
SONG, Yudong; (CN)
Agent: BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD.; 1802, 1803, 1805 Tower B, Grand Place, No 5 Huizhong Road, Chaoyang District Beijing 100101 (CN)
Priority Data:
201610299240.5 06.05.2016 CN
Title (EN) METHOD FOR PRODUCING ACRYLIC ESTER WITH LOW POLLUTANT DISCHARGE
(FR) PROCÉDÉ DE PRODUCTION D'ÉTHER ACRYLIQUE À FAIBLES REJETS POLLUANTS
(ZH) 一种污染物排放量低的丙烯酸酯生产方法
Abstract: front page image
(EN)The present application discloses a method for producing acrylic ester with low pollutant discharge. The method has the advantages of high raw material utilization rate, low concentration, low salinity and low toxicity of waste water pollutant, easy treatment of waste water and etc.
(FR)La présente invention concerne un procédé de production d'éther acrylique à faibles rejets polluants. Le procédé présente les avantages d'avoir un taux élevé d'utilisation de matières premières, une faible concentration, une faible salinité, ainsi qu'une faible toxicité des polluants contenus dans les eaux usées, un traitement facile de celles-ci, etc.
(ZH)本申请公开了一种污染物产生量低的丙烯酸酯生产方法,具有原料利用率高、废水污染物浓度、盐度、毒性低和废水易处理等优点。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)