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1. (WO2017189412) ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/189412 International Application No.: PCT/US2017/029085
Publication Date: 02.11.2017 International Filing Date: 24.04.2017
IPC:
C23C 16/455 (2006.01) ,C23C 16/52 (2006.01)
Applicants: APPLIED MATERIALS, INC.[US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors: CHAN, Kelvin; US
CHEN, Yihong; US
LEE, Jared Ahmad; US
GRIFFIN, Kevin; US
GANDIKOTA, Srinivas; US
YUDOVSKY, Joseph; US
SRIRAM, Mandyam; US
Agent: BLANKMAN, Jeffrey I.; US
Priority Data:
62/327,09125.04.2016US
Title (EN) ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING
(FR) DÉPÔT DE COUCHE ATOMIQUE (ALD) SPATIAL AMÉLIORÉ DE MÉTAUX PAR MÉLANGE RÉGULÉ DE PRÉCURSEURS
Abstract: front page image
(EN) Methods of depositing a film by atomic layer deposition are described. The methods comprise exposing a substrate surface to a first process condition comprising a first reactive gas and a second reactive gas and exposing the substrate surface to a second process condition comprising the second reactive gas. The first process condition comprises less than a full amount of the second reactive gas for a CVD process.
(FR) L'invention concerne des procédés de dépôt d'un film par dépôt de couche atomique. Ces procédés consistent à soumettre une surface de substrat à un premier état de traitement en utilisant un premier gaz réactif et un second gaz réactif; et à soumettre la surface de substrat à un second état de traitement en utilisant le second gaz réactif. On utilise pour le premier état de traitement moins d'une quantité totale du second gaz réactif pour un procédé CVD.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)