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1. (WO2017189234) VHF Z-COIL PLASMA SOURCE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/189234    International Application No.:    PCT/US2017/027174
Publication Date: 02.11.2017 International Filing Date: 12.04.2017
IPC:
H01J 1/52 (2006.01), H05H 1/24 (2006.01)
Applicants: RETRO-SEMI TECHNOLOGIES, LLC [US/US]; 100 Cummings Center Suite 324-J Beverly, MA 01915 (US)
Inventors: KIM, Dong-Soo; (KR).
JOO, Min-Su; (KR)
Agent: MORIARTY, Gordon, R.; (US).
MORIARTY, Gordon, R.; (US).
SCHURGIN, Stanley, M.; (US).
GOUGES D'AGINCOURT, Carolyn; (US).
OCHOA, Ricardo; (US)
Priority Data:
62/329,494 29.04.2016 US
Title (EN) VHF Z-COIL PLASMA SOURCE
(FR) SOURCE DE PLASMA À BOBINE Z VHF
Abstract: front page image
(EN)A VHF Z-coil semiconductor processing plasma source uses Inductively Coupled Plasma (ICP) and has a Z-shaped coil wound about a chamber in two interconnected turns. High frequency RF electric power of from 40 MHz to 120 MHz is supplied by a power source to the coil. A process gas introduced into the chamber is energized by the coil and generates plasma ions of high density suitable for semiconductor dry etching.
(FR)Une source de plasma de traitement de semi-conducteur à bobine Z VHF utilise un plasma à couplage inductif (ICP) et a une bobine en forme de Z enroulée autour d'une chambre dans deux tours interconnectés. Une puissance électrique RF haute fréquence de 40 MHz à 120 MHz est fournie par un bloc d'alimentation à la bobine. Un gaz de traitement introduit dans la chambre est excité par la bobine et génère des ions de plasma de haute densité appropriés pour une gravure à sec de semi-conducteurs.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)