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1. (WO2017189234) VHF Z-COIL PLASMA SOURCE

Pub. No.:    WO/2017/189234    International Application No.:    PCT/US2017/027174
Publication Date: Fri Nov 03 00:59:59 CET 2017 International Filing Date: Thu Apr 13 01:59:59 CEST 2017
IPC: H01J 1/52
H05H 1/24
Applicants: RETRO-SEMI TECHNOLOGIES, LLC
Inventors: KIM, Dong-Soo
JOO, Min-Su
Title: VHF Z-COIL PLASMA SOURCE
Abstract:
A VHF Z-coil semiconductor processing plasma source uses Inductively Coupled Plasma (ICP) and has a Z-shaped coil wound about a chamber in two interconnected turns. High frequency RF electric power of from 40 MHz to 120 MHz is supplied by a power source to the coil. A process gas introduced into the chamber is energized by the coil and generates plasma ions of high density suitable for semiconductor dry etching.