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1. (WO2017188451) COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN-FORMING METHOD
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Pub. No.: WO/2017/188451 International Application No.: PCT/JP2017/017091
Publication Date: 02.11.2017 International Filing Date: 28.04.2017
IPC:
G03F 7/11 (2006.01) ,C08G 8/04 (2006.01) ,G03F 7/26 (2006.01) ,H01L 21/027 (2006.01)
Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC.[JP/JP]; 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324, JP
Inventors: TOIDA, Takumi; JP
MAKINOSHIMA, Takashi; JP
SATO, Takashi; JP
ECHIGO, Masatoshi; JP
Agent: INABA, Yoshiyuki; JP
ONUKI, Toshifumi; JP
NAITO, Kazuhiko; JP
Priority Data:
2016-09179728.04.2016JP
Title (EN) COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN-FORMING METHOD
(FR) COMPOSITION DE FORMATION DE FILM DE SOUS-COUCHE DE RÉSERVE, FILM DE SOUS-COUCHE POUR LITHOGRAPHIE ET PROCÉDÉ DE FORMATION DE MOTIFS
(JA) レジスト下層膜形成用組成物、リソグラフィー用下層膜、及び、パターン形成方法
Abstract:
(EN) Provided is a composition for forming a resist underlayer film, said composition containing a tellurium-containing compound or a tellurium-containing resin.
(FR) L'invention concerne une composition pour former un film de sous-couche de réserve, ladite composition contenant un composé contenant du tellure ou une résine contenant du tellure.
(JA) テルルを含有する化合物又はテルルを含有する樹脂を含有するレジスト下層膜形成用組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)