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1. (WO2017188343) HOLDING DEVICE, EXPOSURE METHOD, EXPOSURE SYSTEM, AND TRANSFER SYSTEM

Pub. No.:    WO/2017/188343    International Application No.:    PCT/JP2017/016613
Publication Date: Fri Nov 03 00:59:59 CET 2017 International Filing Date: Thu Apr 27 01:59:59 CEST 2017
IPC: H01L 21/68
H01L 21/027
Applicants: NIKON CORPORATION
株式会社ニコン
Inventors: SHIBAZAKI, Yuichi
柴崎 祐一
Title: HOLDING DEVICE, EXPOSURE METHOD, EXPOSURE SYSTEM, AND TRANSFER SYSTEM
Abstract:
This holding device is provided with: a shuttle 10 that has a chuck member 22 with which a closed space is formed on the lower side of a wafer W when the wafer is placed on an upper surface, and a ventilation passage 24 in communication with the closed space; and a vacuum suction pad 26, which can be removably attached to the shuttle, and can be transferred with the shuttle, said vacuum suction pad being capable of releasing air from the ventilation passage 24, and being capable of relatively moving in a non-contact manner with respect to the shuttle.