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1. (WO2017188320) SUBSTRATE FOR MAGNETIC DISK
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/188320    International Application No.:    PCT/JP2017/016563
Publication Date: 02.11.2017 International Filing Date: 26.04.2017
IPC:
C22C 21/00 (2006.01), G11B 5/73 (2006.01), C22F 1/00 (2006.01), C22F 1/04 (2006.01)
Applicants: UACJ CORPORATION [JP/JP]; 1-7-2, Otemachi, Chiyoda-ku, Tokyo 1000004 (JP).
FURUKAWA ELECTRIC CO., LTD. [JP/JP]; 2-3, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008322 (JP)
Inventors: NAKAMURA, Toshihiro; (JP).
NAKAYAMA,Takashi; (JP).
IMAKAWA, Kimie; (JP).
KUMAGAI, Wataru; (JP).
TODA, Sadayuki; (JP).
KITAWAKI, Kotaro; (JP).
MURATA, Takuya; (JP).
MATSUI, Yu; (JP).
YONEMITSU, Makoto; (JP).
HATAKEYAMA, Hideyuki; (JP)
Agent: IIDA, Toshizo; (JP).
AKABA, Shuichi; (JP)
Priority Data:
2016-088719 27.04.2016 JP
2016-097439 13.05.2016 JP
Title (EN) SUBSTRATE FOR MAGNETIC DISK
(FR) SUBSTRAT POUR DISQUE MAGNÉTIQUE
(JA) 磁気ディスク用基板
Abstract: front page image
(EN)The present invention provides an aluminum alloy substrate for a magnetic disk in which disk fluttering is less likely to occur. This aluminum alloy substrate for a magnetic disk is characterized in that the sum of the circumferential length of second phase particles having a maximum diameter of 4-30 µm in a metal structure is not less than 10 mm/mm2.
(FR)La présente invention concerne un substrat en alliage d'aluminium pour disque magnétique avec lequel le flottement du disque est moins susceptible de se produire. Ce substrat en alliage d'aluminium pour disque magnétique est caractérisé en ce que la somme de la longueur circonférentielle des particules de seconde phase ayant un diamètre maximal de 4 à 30 µm dans une structure métallique n'est pas inférieure à 10 mm/mm2.
(JA)本発明は、ディスク・フラッタの発生が少ない磁気ディスク用アルミニウム合金基板を提供するものである。 本発明に係る磁気ディスク用アルミニウム合金基板は、金属組織における最長径4μm以上30μm以下の第二相粒子の周囲長の合計が10mm/mm以上であるという特徴を有する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)