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1. (WO2017188120) SELF-ADHESIVE LAYER
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2017/188120    International Application No.:    PCT/JP2017/015904
Publication Date: 02.11.2017 International Filing Date: 20.04.2017
IPC:
C09J 7/00 (2006.01), C09J 7/02 (2006.01), C09J 11/06 (2006.01), C09J 133/04 (2006.01)
Applicants: ZEON CORPORATION [JP/JP]; 6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008246 (JP)
Inventors: SONE, Atsushi; (JP)
Agent: YAMAMOTO, Noriaki; (JP).
YAMASHITA, Akihiko; (JP).
KISHIMOTO, Tatsuhito; (JP)
Priority Data:
2016-091426 28.04.2016 JP
Title (EN) SELF-ADHESIVE LAYER
(FR) COUCHE AUTO-ADHÉSIVE
(JA) 自己粘着性層
Abstract: front page image
(EN)Provided is a self-adhesive layer formed from a reaction product of a resin composition, said resin composition including a resin as well as a cross-linking agent and/or an initiator, wherein the glossiness is between 33 and 90 inclusive, and the amount of formaldehyde generated is 2ppm or less. This self-adhesive layer has excellent air releasability and generates less formaldehyde.
(FR)La présente invention concerne une couche auto-adhésive formée à partir d’un produit réactionnel d’une composition de résine, ladite composition de résine comportant une résine ainsi qu’un agent de réticulation et/ou un initiateur, le brillant étant compris entre 33 et 90 inclus, et la quantité de formaldéhyde généré étant de 2 ppm ou moins. Cette couche auto-adhésive présente une excellente aptitude à la libération d’air et génère moins de formaldéhyde.
(JA)樹脂、並びに、架橋剤及び/又は開始剤を含む樹脂組成物の反応体からなる自己粘着性層であって、光沢度が33以上90以下であり、ホルムアルデヒド発生量が2ppm以下である、自己粘着性層とし、エア抜け性に優れ、ホルムアルデヒドの発生量が低減された自己粘着性層を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)