WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
1. (WO2017186421) IMAGE PROCESSING CONVOLUTION ALGORITHM FOR DEFECT DETECTION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2017/186421 International Application No.: PCT/EP2017/057035
Publication Date: 02.11.2017 International Filing Date: 24.03.2017
IPC:
G03F 7/20 (2006.01) ,G03F 1/84 (2012.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68
Preparation processes not covered by groups G03F1/20-G03F1/5096
82
Auxiliary processes, e.g. cleaning
84
Inspecting
Applicants: ASML HOLDING N.V.[NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors: OU, Guobin; US
Agent: SLENDERS, Peter; NL
Priority Data:
62/328,45927.04.2016US
Title (EN) IMAGE PROCESSING CONVOLUTION ALGORITHM FOR DEFECT DETECTION
(FR) ALGORITHME DE CONVOLUTION DE TRAITEMENT D'IMAGE POUR LA DÉTECTION DE DÉFAUT
Abstract:
(EN) A method including obtaining a first image of an object, generating a second image by convolving the first image with a filter kernel, wherein each pixel value of the second image is a weighted combination of a plurality of accumulation values associated with surrounding pixels of the first image, and determining, based on the second image, whether the object includes a defect.
(FR) La présente invention se rapporte à un procédé qui consiste à obtenir une première image d'un objet, à générer une seconde image par convolution de la première image avec un noyau de filtre, chaque valeur de pixel de la seconde image étant une combinaison pondérée d'une pluralité de valeurs d'accumulation associées à des pixels environnants de la première image, et à déterminer, sur la base de la seconde image, si l'objet comporte un défaut.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)