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1. (WO2017185861) MICROGROOVE SURFACE STRUCTURE FOR IMPROVING EVAPORATION
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Pub. No.: WO/2017/185861 International Application No.: PCT/CN2017/074096
Publication Date: 02.11.2017 International Filing Date: 20.02.2017
IPC:
B01D 1/30 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
1
Evaporating
30
Accessories for evaporators
Applicants:
水爱电器科技(上海)有限公司 SHUIAI ELECTRICAL TECHNOLOGY (SHANGHAI) CO., LTD. [CN/CN]; 中国上海市 浦东新区秀浦路3999弄1号 No.1, Lane 3999, Xiu Pu Road, Pu Dong Shanghai 201315, CN
Inventors:
杨小可 YANG, Xiaoke; CN
李荣 LI, Rong; CN
翁海晶 WENG, Haijing; CN
Agent:
上海恒锐佳知识产权代理事务所(普通合伙) IFUTURE INTELLECTUAL PROPERTY (SHANGHAI) LAW FIRM; 中国上海市 浦东新区蔡伦路780号50I室 Room 50I, No.780, Cailun Road, Pu Dong Shanghai 201203, CN
Priority Data:
201620382741.529.04.2016CN
Title (EN) MICROGROOVE SURFACE STRUCTURE FOR IMPROVING EVAPORATION
(FR) STRUCTURE DE SURFACE DE MICRO-RAINURE POUR UNE ÉVAPORATION AMÉLIORÉE
(ZH) 有利于蒸发的微沟槽表面结构
Abstract:
(EN) A microgroove surface structure for improving evaporation, comprising: a plurality of microgrooves (1) provided on a surface of an object. The microgroove (1) extends along a direction of airflow. The microgroove (1) has a depth of 0.2-4 mm and a width of 0.3-5 mm. A surface of the microgroove (1) has a water contact angle of less than 90 degrees.
(FR) L'invention concerne une structure de surface de micro-rainure permettant d'améliorer une évaporation comprenant : une pluralité de micro-rainures (1) disposées sur une surface d'un objet. La micro-rainure (1) s'étend le long d'une direction d'écoulement d'air. La micro-rainure (1) présente une profondeur de 0,2-4 mm et une largeur de 0,3-5 mm. Une surface de la micro-rainure (1) présente un angle de contact avec l'eau inférieur à 90 degrés.
(ZH) 一种有利于蒸发的微沟槽表面结构,包括设置于物体表面的多个微沟槽(1),微沟槽(1)沿空气的流动方向延伸;微沟槽(1)的深度为0.2~4mm,宽度为0.3~5mm;微沟槽(1)表面的水接触角小于90度。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)